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用于水下低速航行器的耐腐蚀减阻薄膜及制备方法 【EN】Corrosion-resistant drag reduction films and preparation method for underwater lowsteaming device

申请(专利)号:CN201710131053.0国省代码:河南 41
申请(专利权)人:【中文】郑州航空工业管理学院【EN】Zhengzhou Institute of Aeronautical Industry Management
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摘要:
【中文】本发明公开了一种用于水下低速航行器的耐腐蚀减阻薄膜及制备方法,本发明的一种用于水下低速航行器的耐腐蚀减阻薄膜,所述用于水下低速航行器的耐腐蚀减阻薄膜包括硬质材料基底(0),所述硬质材料基底(0)由内向外依次为耐腐蚀膜层和疏水减阻膜层,所述耐腐蚀膜层由内向外依次为金属钛层(11)、氮化钛层(12)、氮化铝钛层(13)和氮化锆层(14),所述疏水减阻膜系由内向外依次为氧化硅层(21)、氧化铟锡层(22)和聚四氟乙烯层(23)。本发明具备水下航行阻力小,优秀的耐腐蚀性能、减阻性能,膜系附着力强,且具有较强的硬度,致密表面均匀,生产工艺自主性高。 【EN】Paragraph:The invention discloses a kind of corrosion-resistant drag reduction films and preparation method for underwater lowsteaming device, a kind of corrosion-resistant drag reduction films for underwater lowsteaming device of the invention, the corrosion-resistant drag reduction films for underwater lowsteaming device include hard material substrate (0), the hard material substrate (0) is followed successively by corrosion-resistant film layer and drag reduction by hydrophobic coating film layer from inside to outside, the corrosion-resistant film layer is followed successively by layer of titanium metal (11) from inside to outside, titanium nitride layer (12), aluminium nitride titanium layer (13) and zirconium nitride layer (14), the drag reduction by hydrophobic coating membrane system is followed successively by silicon oxide layer (21) from inside to outside, indium tin oxide layer (22) and polytetrafluoroethylene ethylene layer (23).The present invention has that underwater navigation resistance is small, and outstanding corrosion resistance, resistance reducing performance, membrane system adhesive force is strong, and has stronger hardness, and compact surfaces are uniform, and production technology independence is high.Image:201710131053.GIF

主权项:
【中文】1.一种用于水下低速航行器的耐腐蚀减阻薄膜,其特征在于:所述用于水下低速航行器的耐腐蚀减阻薄膜包括硬质材料基底(0),所述硬质材料基底(0)由内向外依次为耐腐蚀膜层和疏水减阻膜层,所述耐腐蚀膜层由内向外依次为金属钛层(11)、氮化钛层(12)、氮化铝钛层(13)和氮化锆层(14),所述疏水减阻膜系由内向外依次为氧化硅层(21)、氧化铟锡层(22)和聚四氟乙烯层(23);所述金属钛层(11)的膜层的厚度为10~25nm,所述氮化钛层(12)的膜层的厚度为0.8~1.2μm,所述氮化铝钛层(13)的膜层的厚度为1.0~2.5μm,所述氮化锆层(14)的膜层的厚度为0.6~0.8μm;所述氮化钛层(12)氮含量由内向外逐渐增加;氮化铝钛层(13)氮含量、钛含量由内向外逐渐减少,铝含量逐渐增加;所述氮化锆层(14)氮含量、锆含量由内向外逐渐增加。 【EN】1. a kind of corrosion-resistant drag reduction films for underwater lowsteaming device, it is characterised in that: described to be used for underwater lowsteaming The corrosion-resistant drag reduction films of device include hard material substrate (0), and the hard material substrate (0) is followed successively by corrosion-resistant from inside to outside Film layer and drag reduction by hydrophobic coating film layer, the corrosion-resistant film layer are followed successively by layer of titanium metal (11), titanium nitride layer (12), nitridation from inside to outside Aluminium titanium layer (13) and zirconium nitride layer (14), the drag reduction by hydrophobic coating membrane system are followed successively by silicon oxide layer (21), tin indium oxide from inside to outside Layer (22) and polytetrafluoroethylene ethylene layer (23);The film layer of the layer of titanium metal (11) with a thickness of 10 ~ 25nm, the titanium nitride layer (12) film layer with a thickness of 0.8 ~ 1.2 μm, the film layer of the aluminium nitride titanium layer (13) with a thickness of 1.0 ~ 2.5 μm, the nitrogen Change zirconium layer (14) film layer with a thickness of 0.6 ~ 0.8 μm;Titanium nitride layer (12) nitrogen content gradually increases from inside to outside;Nitridation Aluminium titanium layer (13) nitrogen content, Ti content gradually decrease from inside to outside, and aluminium content gradually increases;Zirconium nitride layer (14) nitrogen contains Amount, zirconium content gradually increase from inside to outside.


说明书

【中文】

用于水下低速航行器的耐腐蚀减阻薄膜及制备方法

技术领域

本发明涉及舰桥玻璃薄膜制造技术领域,具体涉及一种用于水下低速航行器的耐腐蚀减阻薄膜及其制备方法。

背景技术

水下兵器、水下探测器等航行器的发展越发重要,可重复使用的水下探测器执行任务过程中,必将面临抗压、耐腐蚀等重要因素,同时,在使用过程中,希望探测距离可以更远,依次来增加任务执行的多样性;水下兵器,虽然可能为一次性使用,但其在使用前一般存储于舰船或潜艇,也面临严重的潮湿、盐雾现象,同时,兵器对航程的需求更重要,一般希望能获得更大的打击范围。因此,对水下兵器、水下探测器而言,应该解决两方面问题,一是面临高湿度、高盐雾含量环境的存储和使用问题,二是水下兵器的航程问题,期望得到更远的航程范围,以提高作战效能或执行任务能力。

目前,缺乏一种水下航行阻力小的用于水下低速航行器的耐腐蚀减阻薄膜及其制备方法。

发明内容

本发明的目的是针对上述问题,提供一种水下航行阻力小的用于水下低速航行器的耐腐蚀减阻薄膜及其制备方法。

为达到上述目的,本发明采用了下列技术方案:本发明的一种用于水下低速航行器的耐腐蚀减阻薄膜,所述用于水下低速航行器的耐腐蚀减阻薄膜包括硬质材料基底,所述硬质材料基底由内向外依次为耐腐蚀膜层和疏水减阻膜层,所述耐腐蚀膜层由内向外依次为金属钛层、氮化钛层、氮化铝钛层和氮化锆层,所述疏水减阻膜系由内向外依次为氧化硅层、氧化铟锡层和聚四氟乙烯层。

进一步地,所述金属钛层的膜层的厚度为10~25nm,所述氮化钛层的膜层的厚度为0.8~1.2μm,所述氮化铝钛层的膜层的厚度为1.0~2.5μm,所述氮化锆层的膜层的厚度为0.6~0.8μm。

进一步地,所述氮化钛层氮含量由内向外逐渐增加;氮化铝钛层氮含量、钛含量由内向外逐渐减少,铝含量逐渐增加;所述氮化锆层氮含量、锆含量由内向外逐渐增加。

更进一步地,所述氧化硅层的膜层的厚度为15~20nm,所述氧化铟锡层的膜层的厚度为25~55nm,所述聚四氟乙烯层的膜层的厚度为45~70nm。

本发明所述的用于水下低速航行器的耐腐蚀减阻薄膜的制备方法,包括如下步骤:

(1)镀膜环境:采用多弧离子镀设备或非平衡磁控溅射设备中的一种或两种的组合,设备置于洁净度十万级以内、湿度小于60%的洁净室内,设备冷却水温度在15~26℃;多弧离子镀时,本底真空<5.0×10-3Pa,磁控溅射时,本底真空<2.5×10-3Pa;

(2)镀耐腐蚀膜层,采用多弧离子镀,硬质材料基底经去离子水、丙酮、酒精、去离子水清洗后,置于星轮基片架上,抽至本底真空后,硬质材料基底加温至180~240℃,采用氩离子清洗,采用偏压电源,偏压-35~-260V,连续沉积金属钛层、氮化钛层、氮化铝钛层和氮化锆层,镀氮化钛时氮气含量由小变大,镀氮化铝钛氮气、钛偏压由大变小,铝偏压由小变大,时氮化锆氮气流量由小变大,锆偏压由小变大;

(3)耐腐蚀膜层镀膜结束后,停止通入氮气,待抽至本底真空后,开启磁控溅射靶材,采用中频电源或射频电源,依次沉积氧化硅层、氧化铟锡层和聚四氟乙烯层,沉积氧化硅层和氧化铟锡层时通入氧气,所述氧气的流量为1~10sccm,采用射频电源沉积聚四氟乙烯层,磁控溅射镀膜过程中真空度保持在1.8~3.5×10-1Pa;

(4)镀膜结束后,通入氩气保压至基片温度降至室温再出片,制得用于水下低速航行器的耐腐蚀减阻薄膜。

进一步地,对步骤(2)中,镀膜过程中,所述基片架公转速度的范围为6~12r/min。

进一步地,对步骤(3)中,镀膜过程中,所述基片架公转速度的范围为1.5~5r/min。

有益效果:本发明具备水下航行阻力小,优秀的耐腐蚀性能、减阻性能,膜系附着力强,且具有较强的硬度,致密表面均匀,生产工艺自主性高。

与现有技术相比,本发明具有如下优点:

(1)以水下兵器和探测器的存储和工作环境为背景,本发明在提高其耐腐蚀能力的基础上,结合氧化物、氮氧化物、聚四氟乙烯等材料,提高了水下航行器的抗划伤、耐摩擦能力,本发明在水下航行器壳体表面综合采用多弧离子镀和磁控溅射两种方法,同时,结合水下航行特点,以降低表面能量为出发点,有效降低水下航行器的航行阻力。

(2)对耐腐蚀层,综合采用氮化钛、氮化铝钛、氮化锆等强耐腐蚀材料,在具备抗腐蚀能力的同时,具有高的硬度,提高了航行器运输适应能力和使用寿命。

(3)采用降低表面能量的办法,可以明显提高水下兵器、探测器的航程,可有效减低航行阻力,低速航行可减低时阻力达12%以上。且选用材料耐腐蚀能力强,硬度高。

(4)针对以上两种问题,有必要首先解决耐腐蚀问题,在水下航行器表面涂覆一层或多层耐腐蚀薄膜,可以明显提高其耐腐蚀能力,增加使用寿命,同时在其完成增加一层或多层耐腐蚀的减阻膜层,通过降低表面能量,达到疏水减阻效果,从而提高航程。同时,有助于提高水下兵器、探测器的存储寿命和使用寿命。

(5)通过综合采用多弧离子镀、磁控溅射技术,在航行器外壁根据合理设计,依次沉积耐腐蚀膜层、疏水减阻膜层,通过各种材料的合理匹配,达到改善航行器表面抗腐蚀的能力,同时减小水下航行时阻力,提高其表面滑移速度。

附图说明

图1为本发明的用于水下低速航行器的耐腐蚀减阻薄膜的示意图;

其中,0硬质材料基底、11氧化硅层、12氮化钛层、13氮化铝钛层、14氮化锆层、21氮化硅层、22氧化硅层、23聚四氟乙烯层。

具体实施方式

为使本发明的目的、技术方案和优点更加清楚,以下将结合附图对本发明的实施方式作进一步地详细描述。

实施例1

如图1所示,本发明的一种用于水下低速航行器的耐腐蚀减阻薄膜,所述用于水下低速航行器的耐腐蚀减阻薄膜包括硬质材料基底0,所述硬质材料基底0由内向外依次为耐腐蚀膜层和疏水减阻膜层,所述耐腐蚀膜层由内向外依次为金属钛层11、氮化钛层12、氮化铝钛层13和氮化锆层14,所述疏水减阻膜系由内向外依次为氧化硅层21、氧化铟锡层22和聚四氟乙烯层23。

所述金属钛层11的膜层的厚度为10nm,所述氮化钛层12的膜层的厚度为1.2μm,所述氮化铝钛层13的膜层的厚度为1.5μm,所述氮化锆层14的膜层的厚度为0.6μm。

所述氮化钛层12氮含量由内向外逐渐增加;氮化铝钛层13氮含量、钛含量由内向外逐渐减少,铝含量逐渐增加;所述氮化锆层14氮含量、锆含量由内向外逐渐增加。

所述氧化硅层21的膜层的厚度为20nm,所述氧化铟锡层22的膜层的厚度为25nm,所述聚四氟乙烯层23的膜层的厚度为70nm。

本发明所述的用于水下低速航行器的耐腐蚀减阻薄膜的制备方法,包括如下步骤:

(1)镀膜环境:采用多弧离子镀设备,设备置于洁净度十万级以内、湿度小于60%的洁净室内,设备冷却水温度在15℃;多弧离子镀时,本底真空<5.0×10-3Pa,磁控溅射时,本底真空<2.5×10-3Pa;

(2)镀耐腐蚀膜层,采用多弧离子镀,硬质材料基底经去离子水、丙酮、酒精、去离子水清洗后,置于星轮基片架上,抽至本底真空后,硬质材料基底加温至180℃,采用氩离子清洗,采用偏压电源,偏压-260V,连续沉积金属钛层、氮化钛层、氮化铝钛层和氮化锆层,镀氮化钛时氮气含量由小变大,镀氮化铝钛氮气、钛偏压由大变小,铝偏压由小变大,时氮化锆氮气流量由小变大,锆偏压由小变大;镀膜过程中,所述基片架公转速度的范围为6r/min。

(3)耐腐蚀膜层镀膜结束后,停止通入氮气,待抽至本底真空后,开启磁控溅射靶材,采用中频电源或射频电源,依次沉积氧化硅层、氧化铟锡层和聚四氟乙烯层,沉积氧化硅层和氧化铟锡层时通入氧气,所述氧气的流量为5sccm,采用射频电源沉积聚四氟乙烯层,磁控溅射镀膜过程中真空度保持在2.5×10-1Pa;镀膜过程中,所述基片架公转速度的范围为1.5r/min。

(4)镀膜结束后,通入氩气保压至基片温度降至室温再出片,制得用于水下低速航行器的耐腐蚀减阻薄膜。

实施例2

实施例2与实施例1的区别在于:

本发明的一种用于水下低速航行器的耐腐蚀减阻薄膜,所述金属钛层11的膜层的厚度为15nm,所述氮化钛层12的膜层的厚度为0.8μm,所述氮化铝钛层13的膜层的厚度为1.0μm,所述氮化锆层14的膜层的厚度为0.7μm。

所述氧化硅层21的膜层的厚度为18nm,所述氧化铟锡层22的膜层的厚度为45nm,所述聚四氟乙烯层23的膜层的厚度为45nm。

本发明所述的用于水下低速航行器的耐腐蚀减阻薄膜的制备方法,包括如下步骤:

在步骤(1)中,镀膜环境:采用多弧离子镀设备和非平衡磁控溅射设备两种的组合,设备置于洁净度十万级以内、湿度小于60%的洁净室内,设备冷却水温度在20℃;多弧离子镀时,本底真空<5.0×10-3Pa,磁控溅射时,本底真空<2.5×10-3Pa;

在步骤(2)中,镀耐腐蚀膜层,采用多弧离子镀,硬质材料基底经去离子水、丙酮、酒精、去离子水清洗后,置于星轮基片架上,抽至本底真空后,硬质材料基底加温至220℃,采用氩离子清洗,采用偏压电源,偏压-35V,连续沉积金属钛层、氮化钛层、氮化铝钛层和氮化锆层;镀膜过程中,所述基片架公转速度的范围为12r/min。

在步骤(3)中,耐腐蚀膜层镀膜结束后,停止通入氮气,待抽至本底真空后,开启磁控溅射靶材,采用中频电源或射频电源,依次沉积氧化硅层、氧化铟锡层和聚四氟乙烯层,沉积氧化硅层和氧化铟锡层时通入氧气,所述氧气的流量为1sccm,采用射频电源沉积聚四氟乙烯层,磁控溅射镀膜过程中真空度保持在1.8×10-1Pa;镀膜过程中,所述基片架公转速度的范围为2.5r/min。

实施例3

实施例3与实施例1的区别在于:本发明的

本发明的一种用于水下低速航行器的耐腐蚀减阻薄膜,所述金属钛层11的膜层的厚度为25nm,所述氮化钛层12的膜层的厚度为0.95μm,所述氮化铝钛层13的膜层的厚度为2.5μm,所述氮化锆层14的膜层的厚度为0.8μm。

所述氧化硅层21的膜层的厚度为15nm,所述氧化铟锡层22的膜层的厚度为55nm,所述聚四氟乙烯层23的膜层的厚度为60nm。

本发明所述的用于水下低速航行器的耐腐蚀减阻薄膜的制备方法,包括如下步骤:

在步骤(1)中,镀膜环境:采用非平衡磁控溅射设备,设备置于洁净度十万级以内、湿度小于60%的洁净室内,设备冷却水温度在26℃;多弧离子镀时,本底真空<5.0×10-3Pa,磁控溅射时,本底真空<2.5×10-3Pa;

在步骤(2)中,镀耐腐蚀膜层,采用多弧离子镀,硬质材料基底经去离子水、丙酮、酒精、去离子水清洗后,置于星轮基片架上,抽至本底真空后,硬质材料基底加温至240℃,采用氩离子清洗,采用偏压电源,偏压-160V,连续沉积金属钛层、氮化钛层、氮化铝钛层和氮化锆层;镀膜过程中,所述基片架公转速度的范围为8r/min。

在步骤(3)中,耐腐蚀膜层镀膜结束后,停止通入氮气,待抽至本底真空后,开启磁控溅射靶材,采用中频电源或射频电源,依次沉积氧化硅层、氧化铟锡层和聚四氟乙烯层,沉积氧化硅层和氧化铟锡层时通入氧气,所述氧气的流量为10sccm,采用射频电源沉积聚四氟乙烯层,磁控溅射镀膜过程中真空度保持在3.5×10-1Pa;镀膜过程中,所述基片架公转速度的范围为5r/min。

尽管本文较多地使用了硬质材料基底0、氧化硅层11、氮化钛层12、氮化铝钛层13、氮化锆层14、氮化硅层21、氧化硅层22、聚四氟乙烯层23等等术语,但并不排除使用其它术语的可能性。使用这些术语仅仅是为了更方便地描述和解释本发明的本质;把它们解释成任何一种附加的限制都是与本发明精神相违背的。

本文中所描述的具体实施例仅仅是对本发明精神作举例说明。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,但并不会偏离本发明的精神或者超越所附权利要求书所定义的范围。

【EN】

Corrosion-resistant drag reduction films and preparation method for underwater lowsteaming device

Technical field

The present invention relates to bridge glass film manufacturing technology fields, and in particular to a kind of for the resistance to of underwater lowsteaming device

Corrode drag reduction films and preparation method thereof.

Background technique

The development of the aircraft such as underwater ordnance, underwater detectoscope is more important, and reusable underwater detectoscope executes

During task, the key factors such as resistance to compression, corrosion-resistant will be faced, meanwhile, in use, it is desirable to which detection range can be more

Far, successively increase the diversity of task execution;Underwater ordnance, although may be to be disposable, it be using as previous

It is stored in naval vessel or submarine, also faces serious moist, salt fog phenomenon, meanwhile, demand of the weapons to voyage is more important, general uncommon

Prestige can obtain bigger strike range.Therefore, for underwater ordnance, underwater detectoscope, it should solve the problems, such as two aspects, first is that

Face high humility, the storage of high salt fog content environment and using problem, second is that the voyage problem of underwater ordnance, it is expected that obtaining farther

Voyage range, with improve fighting efficiency or execute task ability.

Currently, lacking a kind of small corrosion-resistant drag reduction films and its system for underwater lowsteaming device of underwater navigation resistance

Preparation Method.

Summary of the invention

Regarding the issue above, the present invention provides a kind of underwater navigation resistance it is small be used for underwater lowsteaming device

Corrosion-resistant drag reduction films and preparation method thereof.

In order to achieve the above objectives, present invention employs following technical proposals: one kind of the invention is used for underwater lowsteaming

The corrosion-resistant drag reduction films of device, the corrosion-resistant drag reduction films for underwater lowsteaming device include hard material substrate, institute

State hard material substrate and be followed successively by corrosion-resistant film layer and drag reduction by hydrophobic coating film layer from inside to outside, the corrosion-resistant film layer from inside to outside according to

Secondary is layer of titanium metal, titanium nitride layer, aluminium nitride titanium layer and zirconium nitride layer, and the drag reduction by hydrophobic coating membrane system is followed successively by oxidation from inside to outside

Silicon layer, indium tin oxide layer and polytetrafluoroethylene ethylene layer.

Further, the film layer of the layer of titanium metal with a thickness of 10~25nm, the thickness of the film layer of the titanium nitride layer

Be 0.8~1.2 μm, the film layer of the aluminium nitride titanium layer with a thickness of 1.0~2.5 μm, the thickness of the film layer of the zirconium nitride layer

It is 0.6~0.8 μm.

Further, the titanium nitride layer nitrogen content gradually increases from inside to outside;Aluminium nitride titanium layer nitrogen content, Ti content by

It gradually decreases from inside to outside, aluminium content gradually increases;The zirconium nitride layer nitrogen content, zirconium content gradually increase from inside to outside.

Further, the film layer of the silicon oxide layer with a thickness of 15~20nm, the film layer of the indium tin oxide layer

With a thickness of 25~55nm, the film layer of the polytetrafluoroethylene ethylene layer with a thickness of 45~70nm.

The preparation method of corrosion-resistant drag reduction films of the present invention for underwater lowsteaming device, including walk as follows

It is rapid:

(1) film coating environment: using the group of one or both of multi-arc ion plating equipment or non-balance magnetically controlled sputter equipment

It closes, equipment is placed within 100,000 grades of cleanliness, in toilet of the humidity less than 60%, and component cooling water temperature is at 15~26 DEG C;

When multi-arc ion coating, base vacuum < 5.0 × 10-3Pa, when magnetron sputtering, base vacuum < 2.5 × 10-3Pa;

(2) plate corrosion-resistant film layer, using multi-arc ion coating, hard material substrate through deionized water, acetone, alcohol, go from

It after sub- water cleaning, is placed in star-wheel substrate frame, after being evacuated to base vacuum, hard material substrate is heated up to 180~240 DEG C, uses

Argon ion cleaning, using grid bias power supply, bias -35~-260V, successive sedimentation layer of titanium metal, titanium nitride layer, aluminium nitride titanium layer and

Zirconium nitride layer, nitrogen content changes from small to big when titanium-nitride, and from large to small, aluminium bias is by small for plating TiAlN nitrogen, titanium bias

Become larger, when zirconium nitride nitrogen flow change from small to big, zirconium bias changes from small to big;

(3) after corrosion-resistant film layer plated film, stopping is passed through nitrogen, after being evacuated to base vacuum, opens magnetic controlled sputtering target

Material is sequentially depositing silicon oxide layer, indium tin oxide layer and polytetrafluoroethylene ethylene layer, deposited oxide using intermediate frequency power supply or radio-frequency power supply

Oxygen is passed through when silicon layer and indium tin oxide layer, the flow of the oxygen is 1~10sccm, deposits polytetrafluoroethyl-ne using radio-frequency power supply

Alkene layer, vacuum degree is maintained at 1.8~3.5 × 10 during magnetron sputtering plating-1Pa;

(4) it after plated film, is passed through argon gas pressure maintaining to substrate temperature and is down to room temperature slice again, be made and navigate for underwater low speed

The corrosion-resistant drag reduction films of row device.

Further, in step (2), in coating process, the range of the substrate frame revolution speed is 6~12r/min.

Further, in step (3), in coating process, the range of the substrate frame revolution speed is 1.5~5r/

min。

The utility model has the advantages that the present invention has, underwater navigation resistance is small, outstanding corrosion resistance, resistance reducing performance, membrane system attachment

Power is strong, and has stronger hardness, and compact surfaces are uniform, and production technology independence is high.

Compared with prior art, the present invention has the advantage that

(1) using the storage of underwater ordnance and detector and working environment as background, the present invention is improving its corrosion resistance

On the basis of, in conjunction with materials such as oxide, nitrogen oxides, polytetrafluoroethylene (PTFE), improve scratch resistance, the rub resistance of submarine navigation device

Ability, vehicle hull surface generalization uses two methods of multi-arc ion coating and magnetron sputtering to the present invention under water, meanwhile, in conjunction with

The ship resistance of submarine navigation device is effectively reduced to reduce surface energy as starting point in underwater navigation feature.

(2) comprehensive using strong corrosion resistants materials such as titanium nitride, TiAlN, zirconium nitrides to anti-corrosion layer, having anti-corruption

While erosion ability, there is high hardness, improve aircraft transport adaptability and service life.

(3) using the method for reducing surface energy, the voyage of underwater ordnance, detector can be significantly improved, can effectively be subtracted

Low ship resistance, resistance is up to 12% or more when lowsteaming can lower.And the selection of material corrosion resistance is strong, hardness is high.

(4) it is directed to both the above problem, it is necessary to solve the problems, such as corrosion-resistant, one layer of aircraft surface coating under water first

Or multilayer corrosion-resistance film, can significantly improve its corrosion resistance, increase service life, at the same its complete to increase by one layer or

The drag reduction film layer of multilayer corrosion-resistance reaches drag reduction by hydrophobic coating effect, to improve voyage by reducing surface energy.Meanwhile it helping

In the storage life and service life that improve underwater ordnance, detector.

(5) multi-arc ion coating, magnetron sputtering technique are used by comprehensive, in aircraft outer wall according to rational design, successively

Corrosion-resistant film layer, drag reduction by hydrophobic coating film layer are deposited, by the Proper Match of a variety of materials, it is erosion-resisting to reach improvement aircraft surface

Ability, while resistance when reducing underwater navigation, improve its surface sliding speed.

Detailed description of the invention

Fig. 1 is the schematic diagram of the corrosion-resistant drag reduction films for underwater lowsteaming device of the invention;

Wherein, 0 hard material substrate, 11 silicon oxide layers, 12 titanium nitride layers, 13 aluminium nitride titanium layers, 14 zirconium nitride layers, 21 nitrogen

SiClx layer, 22 silicon oxide layers, 23 polytetrafluoroethylene ethylene layers.

Specific embodiment

To make the object, technical solutions and advantages of the present invention clearer, below with reference to attached drawing to implementation of the invention

Mode is described in further detail.

Embodiment 1

As shown in Figure 1, a kind of corrosion-resistant drag reduction films for underwater lowsteaming device of the invention, described for underwater

The corrosion-resistant drag reduction films of lowsteaming device include hard material substrate 0, and the hard material substrate 0 is followed successively by resistance to from inside to outside

Corrode film layer and drag reduction by hydrophobic coating film layer, the corrosion-resistant film layer is followed successively by layer of titanium metal 11, titanium nitride layer 12, nitridation from inside to outside

Aluminium titanium layer 13 and zirconium nitride layer 14, the drag reduction by hydrophobic coating membrane system are followed successively by silicon oxide layer 21,22 and of indium tin oxide layer from inside to outside

Polytetrafluoroethylene ethylene layer 23.

The film layer of the layer of titanium metal 11 with a thickness of 10nm, the film layer of the titanium nitride layer 12 with a thickness of 1.2 μm, institute

State the film layer of aluminium nitride titanium layer 13 with a thickness of 1.5 μm, the film layer of the zirconium nitride layer 14 with a thickness of 0.6 μm.

12 nitrogen content of titanium nitride layer gradually increases from inside to outside;13 nitrogen content of aluminium nitride titanium layer, Ti content are by introversion

It gradually decreases outside, aluminium content gradually increases;14 nitrogen content of zirconium nitride layer, zirconium content gradually increase from inside to outside.

The film layer of the silicon oxide layer 21 with a thickness of 20nm, the film layer of the indium tin oxide layer 22 with a thickness of 25nm,

The film layer of the polytetrafluoroethylene ethylene layer 23 with a thickness of 70nm.

The preparation method of corrosion-resistant drag reduction films of the present invention for underwater lowsteaming device, including walk as follows

It is rapid:

(1) film coating environment: multi-arc ion plating equipment is used, equipment is placed within 100,000 grades of cleanliness, humidity is less than 60%

Toilet in, component cooling water temperature is at 15 DEG C;When multi-arc ion coating, base vacuum < 5.0 × 10-3Pa, when magnetron sputtering,

Base vacuum < 2.5 × 10-3Pa;

(2) plate corrosion-resistant film layer, using multi-arc ion coating, hard material substrate through deionized water, acetone, alcohol, go from

After sub- water cleaning, it is placed in star-wheel substrate frame, after being evacuated to base vacuum, hard material substrate is heated up to 180 DEG C, using argon ion

Cleaning, using grid bias power supply, bias -260V, successive sedimentation layer of titanium metal, titanium nitride layer, aluminium nitride titanium layer and zirconium nitride layer, plating

Nitrogen content changes from small to big when titanium nitride, plating TiAlN nitrogen, titanium bias from large to small, aluminium bias changes from small to big, when nitrogenize

Zirconium nitrogen flow changes from small to big, and zirconium bias changes from small to big;In coating process, the range of the substrate frame revolution speed is 6r/

min。

(3) after corrosion-resistant film layer plated film, stopping is passed through nitrogen, after being evacuated to base vacuum, opens magnetic controlled sputtering target

Material is sequentially depositing silicon oxide layer, indium tin oxide layer and polytetrafluoroethylene ethylene layer, deposited oxide using intermediate frequency power supply or radio-frequency power supply

Oxygen is passed through when silicon layer and indium tin oxide layer, the flow of the oxygen is 5sccm, deposits polytetrafluoroethylene (PTFE) using radio-frequency power supply

Layer, vacuum degree is maintained at 2.5 × 10 during magnetron sputtering plating-1Pa;In coating process, the model of the substrate frame revolution speed

It encloses for 1.5r/min.

(4) it after plated film, is passed through argon gas pressure maintaining to substrate temperature and is down to room temperature slice again, be made and navigate for underwater low speed

The corrosion-resistant drag reduction films of row device.

Embodiment 2

Embodiment 2 the difference from embodiment 1 is that:

A kind of corrosion-resistant drag reduction films for underwater lowsteaming device of the invention, the film layer of the layer of titanium metal 11

With a thickness of 15nm, the film layer of the titanium nitride layer 12 with a thickness of 0.8 μm, the film layer of the aluminium nitride titanium layer 13 with a thickness of

1.0 μm, the film layer of the zirconium nitride layer 14 with a thickness of 0.7 μm.

The film layer of the silicon oxide layer 21 with a thickness of 18nm, the film layer of the indium tin oxide layer 22 with a thickness of 45nm,

The film layer of the polytetrafluoroethylene ethylene layer 23 with a thickness of 45nm.

The preparation method of corrosion-resistant drag reduction films of the present invention for underwater lowsteaming device, including walk as follows

It is rapid:

In step (1), film coating environment: using multi-arc ion plating equipment and two kinds of non-balance magnetically controlled sputter equipment of group

It closes, equipment is placed within 100,000 grades of cleanliness, in toilet of the humidity less than 60%, and component cooling water temperature is at 20 DEG C;Multi sphere

When ion plating, base vacuum < 5.0 × 10-3Pa, when magnetron sputtering, base vacuum < 2.5 × 10-3Pa;

In step (2), plate corrosion-resistant film layer, using multi-arc ion coating, hard material substrate through deionized water, acetone,

After alcohol, deionized water cleaning, it is placed in star-wheel substrate frame, after being evacuated to base vacuum, hard material substrate is heated up to 220 DEG C,

It is cleaned using argon ion, using grid bias power supply, bias -35V, successive sedimentation layer of titanium metal, titanium nitride layer, aluminium nitride titanium layer and nitrogen

Change zirconium layer;In coating process, the range of the substrate frame revolution speed is 12r/min.

In step (3), after corrosion-resistant film layer plated film, stopping is passed through nitrogen, after being evacuated to base vacuum, opens magnetic

It controls sputtering target material and silicon oxide layer, indium tin oxide layer and polytetrafluoroethylene ethylene layer is sequentially depositing using intermediate frequency power supply or radio-frequency power supply,

Oxygen is passed through when silicon oxide layer deposited and indium tin oxide layer, the flow of the oxygen is 1sccm, using radio-frequency power supply deposition poly- four

Vinyl fluoride layer, vacuum degree is maintained at 1.8 × 10 during magnetron sputtering plating-1Pa;In coating process, the substrate frame revolution speed

The range of degree is 2.5r/min.

Embodiment 3

Embodiment 3 the difference from embodiment 1 is that: it is of the invention

A kind of corrosion-resistant drag reduction films for underwater lowsteaming device of the invention, the film layer of the layer of titanium metal 11

With a thickness of 25nm, the film layer of the titanium nitride layer 12 with a thickness of 0.95 μm, the film layer of the aluminium nitride titanium layer 13 with a thickness of

2.5 μm, the film layer of the zirconium nitride layer 14 with a thickness of 0.8 μm.

The film layer of the silicon oxide layer 21 with a thickness of 15nm, the film layer of the indium tin oxide layer 22 with a thickness of 55nm,

The film layer of the polytetrafluoroethylene ethylene layer 23 with a thickness of 60nm.

The preparation method of corrosion-resistant drag reduction films of the present invention for underwater lowsteaming device, including walk as follows

It is rapid:

In step (1), film coating environment: using non-balance magnetically controlled sputter equipment, equipment is placed within 100,000 grades of cleanliness,

In toilet of the humidity less than 60%, component cooling water temperature is at 26 DEG C;When multi-arc ion coating, base vacuum < 5.0 × 10-3Pa,

When magnetron sputtering, base vacuum < 2.5 × 10-3Pa;

In step (2), plate corrosion-resistant film layer, using multi-arc ion coating, hard material substrate through deionized water, acetone,

After alcohol, deionized water cleaning, it is placed in star-wheel substrate frame, after being evacuated to base vacuum, hard material substrate is heated up to 240 DEG C,

Cleaned using argon ion, using grid bias power supply, bias -160V, successive sedimentation layer of titanium metal, titanium nitride layer, aluminium nitride titanium layer and

Zirconium nitride layer;In coating process, the range of the substrate frame revolution speed is 8r/min.

In step (3), after corrosion-resistant film layer plated film, stopping is passed through nitrogen, after being evacuated to base vacuum, opens magnetic

It controls sputtering target material and silicon oxide layer, indium tin oxide layer and polytetrafluoroethylene ethylene layer is sequentially depositing using intermediate frequency power supply or radio-frequency power supply,

Oxygen is passed through when silicon oxide layer deposited and indium tin oxide layer, the flow of the oxygen is 10sccm, is deposited using radio-frequency power supply poly-

Tetrafluoroethene layer, vacuum degree is maintained at 3.5 × 10 during magnetron sputtering plating-1Pa;In coating process, the substrate frame revolution

The range of speed is 5r/min.

Although be used more herein hard material substrate 0, silicon oxide layer 11, titanium nitride layer 12, aluminium nitride titanium layer 13,

Zirconium nitride layer 14, silicon nitride layer 21, silicon oxide layer 22, polytetrafluoroethylene ethylene layer 23 etc. term, but be not precluded and use other arts

A possibility that language.The use of these items is only for be more convenient to describe and explain essence of the invention;It is construed as

Any additional limitation is disagreed with spirit of that invention.

Specific embodiment described herein is only an example for the spirit of the invention.The neck of technology belonging to the present invention

The technical staff in domain can make various modifications or additions to the described embodiments or replace by a similar method

In generation, however, it does not deviate from the spirit of the invention or beyond the scope of the appended claims.

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