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一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法及其应用 【EN】A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances the method and its application of combination

申请(专利)号:CN201711046343.1国省代码:四川 51
申请(专利权)人:【中文】中国工程物理研究院材料研究所【EN】Inst. of Materials, Chinese Academy of Engineering Physics
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摘要:
【中文】本发明公开了一种轴对称半封闭曲面件内表面镀层均匀增强结合的物理气相沉积方法及其应用,目的在于解决采用现有方法对轴对称半封闭曲面件内表面进行辉光放电清洗时,基于电场分布存在的“法拉第杯”效应,导致辉光放电清洗与镀膜过程中的离子轰击作用主要集中在轴对称半封闭曲面件内表面的口部,并导致轴对称半封闭曲面件内表面其余部位镀层与基体结合能力较弱的问题。本发明通过象形辅助阳极来改变轴对称半封闭曲面工件内表面的电场分布,从而增强辉光放电清洗过程中的离子轰击作用,获得镀前工件洁净表面,最终有效增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合性能。本发明能有效实现轴对称半封闭曲面工件内表面磁控溅射镀层与基体之间的均匀增强结合,显著提升装备制造水平。 【EN】Paragraph:The invention discloses physical gas-phase deposite method and its applications that a kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, when purpose is to solve to carry out Glow Discharge Cleaning to the semiclosed curved-surface piece inner surface of axial symmetry using existing method, based on " Faraday cup " effect existing for field distribution, cause the ion bombardment effects in Glow Discharge Cleaning and coating process to be concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, and leads to remaining position coating of the semiclosed curved-surface piece inner surface of axial symmetry and the weaker problem of matrix binding ability.The present invention changes the field distribution of the semiclosed curve surface work pieces inner surface of axial symmetry by pictograph impressed current anode, to enhance the ion bombardment effects during Glow Discharge Cleaning, obtain workpiece clean surface before plating, the binding performance of the final effectively enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry.The present invention can effectively realize that the uniform enhancing between the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry and matrix is combined, and be obviously improved equipment manufacturing level.Image:201711046343.GIF

主权项:
【中文】1.一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法,其特征在于,包括如下步骤: (1)将轴对称半封闭曲面工件的开口部朝下设置,并将圆形平面磁控溅射靶设置于轴对称半封闭曲面工件下方,且轴对称半封闭曲面工件与圆形平面磁控溅射靶的轴线相重合,轴对称半封闭曲面工件与圆形平面磁控溅射靶之间保持一定的距离; (2)在轴对称半封闭曲面工件的开口部设置一个与轴对称半封闭曲面工件内表面相配合的象形辅助阳极,且象形辅助阳极的轴线与圆形平面磁控溅射靶的轴线重合; (3)使象形辅助阳极与轴对称半封闭曲面工件相对转动,进行物理气相沉积,当镀层达到设定值后,即可; 所述步骤(3)中,进行物理气相沉积包括:辉光放电清洗过程、镀膜过程;在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连;在镀膜过程中,象形辅助阳极接地;当镀层达到设定值后,即可。 【EN】1. a kind of method that semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, which is characterized in that including as follows Step: (1) opening portion of the semiclosed curve surface work pieces of axial symmetry is arranged downward, and circular flat magnetic controlled sputtering target is set to axis Below symmetrical semiclosed curve surface work pieces, and the semiclosed curve surface work pieces of axial symmetry are mutually be overlapped with the axis of circular flat magnetic controlled sputtering target It closes, is maintained a certain distance between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target; (2) it is arranged one in the opening portion of the semiclosed curve surface work pieces of axial symmetry to match with the semiclosed curve surface work pieces inner surface of axial symmetry The pictograph impressed current anode of conjunction, and the axis of pictograph impressed current anode is overlapped with the axis of circular flat magnetic controlled sputtering target; (3) pictograph impressed current anode and the semiclosed curve surface work pieces of axial symmetry are relatively rotated, physical vapour deposition (PVD) is carried out, when coating reaches To after setting value; In the step (3), carrying out physical vapour deposition (PVD) includes: Glow Discharge Cleaning process, coating process;It is clear in glow discharge During washing, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode ground connection;When coating reaches To after setting value.


说明书

【中文】

一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法及

其应用

技术领域

本发明涉及镀层制备领域,尤其是磁控溅射镀层结合性能增强领域,具体为一种轴对称半封闭曲面工件内表面磁控溅射镀层结合性能的增强方法。

背景技术

磁控溅射是一种工业化镀层沉积技术,其工作原理如下:电子在溅射靶面正交电磁场中做螺旋运动,并与工作气体(如氩气)发生碰撞,使工作气体电离为离子(如氩离子),离子在溅射阴极的电场作用下加速,获能飞向靶面的动能,并与靶面原子发生碰撞,而使靶材原子被溅射出来,被溅射出来的靶材原子沉积到工件表面,而形成镀层。为了满足工程应用,磁控溅射镀层与基体之间需要有较好的结合性能。

在磁控溅射镀层制备过程中,为了使镀层与基体之间具有较好的结合性能,通常需要对基体在一定负偏压下进行辉光放电清洗。在辉光放电清洗过程中,在工件表面负偏压电场的作用下,辉光放电等离子体中的离子飞向工件,并与工件表面发生轰击,通过动量传递来去除工件表面污染物质,从而获取洁净表面。其中,辉光放电清洗过程中的离子轰击是增强磁控溅射镀层与基体结合的重要因素。

对于普通平面、圆柱状、凸面工件,辉光放电清洗与镀膜过程中的离子轰击效果较好,磁控溅射镀层与基体通常具有较好的结合性能。但对于轴对称半封闭曲面件内表面,由于辉光放电清洗过程中电场分布存在“法拉第杯”效应(如图2所示),辉光放电清洗与镀膜过程中的离子轰击作用主要集中在轴对称半封闭曲面件内表面的口部,距口部越远,电场越弱,离子轰击效果越差,进而导致镀层与基体结合越弱,甚至出现镀层与基体没有结合而鼓泡,甚至脱落的现象。

在实际工程应用中,工件表面的镀层通常具有装饰、耐磨、防腐蚀等特殊表面功能,镀层与基体结合不足必将影响到镀层后工件的表面性能。

为此,迫切需要一种新的装置和/或方法,以解决上述问题。

发明内容

本发明的发明目的在于:针对采用现有方法对轴对称半封闭曲面件内表面进行辉光放电清洗时,基于电场分布存在的“法拉第杯”效应,导致辉光放电清洗与镀膜过程中的离子轰击作用主要集中在轴对称半封闭曲面件内表面的口部,距口部越远,电场越弱,离子轰击效果越差,并导致镀层与基体结合能力较弱的问题,提供一种轴对称半封闭曲面件内表面镀层均匀增强结合的物理气相沉积方法及其应用。本发明通过象形辅助阳极来改变轴对称半封闭曲面工件内表面的电场分布,从而增强辉光放电清洗过程中的离子轰击作用,获得镀前工件洁净表面,最终有效增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合性能。本发明的操作简单,工艺可控,可重复性好,能够满足工业化大规模生产和应用的需要,有效实现轴对称半封闭曲面工件内表面磁控溅射镀层与基体之间的牢固结合,显著提升装备制造水平,具有较高的应用价值和较好的应用前景。

为了实现上述目的,本发明采用如下技术方案:

一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法,包括如下步骤:

(1)将轴对称半封闭曲面工件的开口部朝下设置,并将圆形平面磁控溅射靶设置于轴对称半封闭曲面工件下方,且轴对称半封闭曲面工件与圆形平面磁控溅射靶的轴线相重合,轴对称半封闭曲面工件与圆形平面磁控溅射靶之间保持一定的距离;

(2)在轴对称半封闭曲面工件的开口部设置一个与轴对称半封闭曲面工件内表面相配合的象形辅助阳极,且象形辅助阳极的轴线与圆形平面磁控溅射靶的轴线重合;

(3)使象形辅助阳极与轴对称半封闭曲面工件相对转动,进行物理气相沉积,当镀层达到设定值后,即可。

所述步骤3中,进行物理气相沉积包括:辉光放电清洗过程、镀膜过程;在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连;在镀膜过程中,象形辅助阳极接地;当镀层达到设定值后,即可。

所述步骤3中,象形辅助阳极静止,轴对称半封闭曲面工件沿其轴线转动;

或轴对称半封闭曲面工件静止,象形辅助阳极沿其轴线转动;

或以轴对称半封闭曲面工件的轴线为旋转轴,轴对称半封闭曲面工件与象形辅助阳极沿旋转轴相对转动。

所述步骤1中,轴对称半封闭曲面工件与圆形平面磁控溅射靶之间形成间隙。

所述步骤2中,象形辅助阳极包括与轴对称半封闭曲面工件开口部相配合的第一圆环、与轴对称半封闭曲面工件内表面相配合的弧形连接杆、阳极连接杆,所述弧形连接杆为至少两个且弧形连接杆与第一圆环连接为一体构成阳极主体,所述阳极主体与阳极连接杆相连。

还包括第二圆环,所述弧形连接杆的两端分别与第一圆环、第二圆环相连为一体。

所述弧形连接杆为四个且均布于第一圆环与第二圆环之间。

前述方法的应用,将其用于轴对称曲面工件内表面带偏压的镀层均匀增强结合的物理气相沉积。

将其用于磁控溅射制备轴对称半封闭曲面件内表面镀层。

为了解决现有轴对称半封闭曲面工件内表面磁控溅射镀层结合性能较差且不均的技术问题,本发明提供一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法,具体为一种轴对称半封闭曲面工件内表面磁控溅射镀层结合性能的增强方法。该方法包括如下步骤:将轴对称半封闭曲面工件口部朝下放置,圆形平面磁控溅射靶位于其下方,二者轴线重合,靶与轴对称半封闭曲面工件口部保持一定距离;在轴对称半封闭曲面工件内口部放置一象形辅助阳极,且其轴线与工件轴线重合;在沉积过程中,象形辅助阳极静止、轴对称半封闭曲面工件沿工件轴线转动,或者轴对称半封闭曲面工件静止、象形辅助阳极沿轴线转动。在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连。本发明中,通过在轴对称半封闭曲面工件内表面设置辅助阳极,来改善工艺过程中轴对称半封闭曲面工件内表面电位分布的均匀性,从而增强辉光放电清洗过程中离子在各部位的均匀轰击作用。即在工件镀前辉光放电清洗过程中,通过在辅助阳极上施加正电位来改善轴对称半封闭曲面工件内表面电位分布的均匀性,从而改善各部位离子轰击的均匀性,达到有效均匀清洗的目的,最终增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合强度。

本发明适用于轴对称曲面工件内表面工艺过程中带偏压的镀层均匀增强结合的物理气相沉积,且不仅限于磁控溅射技术。

进一步,本发明提供一种象形辅助阳极的具体结构。该象形辅助阳极包括与轴对称半封闭曲面工件开口部相配合的第一圆环、与轴对称半封闭曲面工件内表面相配合的弧形连接杆、用于与电源相连的阳极连接杆,弧形连接杆为至少两个且弧形连接杆与第一圆环连接为一体构成阳极主体,阳极主体与阳极连接杆相连。该结构制备的象形辅助阳极与轴对称半封闭曲面工件的内表面相一致,且结构简单,生产成本低,并能有效解决本发明的技术问题。

进一步,该象形辅助阳极还包括第二圆环,弧形连接杆的两端分别与第一圆环、第二圆环相连为一体。本发明采用第一圆环、第二圆环相互配合,其有利于象形辅助阳极的加工和制造,降低生产成本。

在一个具体的实例中,弧形连接杆为四个且均布于第一圆环与第二圆环之间;将轴对称半封闭曲面工件口部朝下放置,圆形平面磁控溅射靶位于其下方,二者轴线重合,靶与轴对称曲面口部保持一定距离(靶-基距);在轴对称曲面内部放置一个与工件内表面象形的辅助阳极,其轴线与工件轴线重合,辅助阳极与工件内表面的距离为3 cm;在辉光放电清洗过程中,工作气体氩气的气压为2.0 Pa,工件偏压为-800V,辅助阳极电压为+50V,清洗时间30min;在镀膜过程中,辅助阳极接地;工艺过程中,工件保持转动,而象形辅助阳极保持静止。

本发明通过象形辅助阳极来改变轴对称半封闭曲面工件内表面的电场分布,从而增强辉光放电清洗过程中的离子轰击作用,获得镀前工件洁净表面,最终有效增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合性能。经测定,本发明能将内径Φ260mm的轴对称半封闭曲面工件内表面磁控溅射镀层结合强度由最小约3MPa大幅提高到约20MPa,具有显著的技术进步。

综上所述,本发明能够有效克服传统方法的不足,在轴对称半封闭曲面工件内表面实现磁控溅射镀层与基体之间的牢固结合,其方法简单,工艺可控,流程短,处理效果好。实践进一步表明,本发明能显著提高轴对称半封闭曲面工件内表面磁控溅射镀层的结合强度,具有较高的应用价值。

附图说明

本发明将通过例子并参照附图的方式说明,其中:

图1为传统方法轴对称半封闭曲面工件内表面磁控溅射示意图。

图2为传统方法轴对称半封闭曲面工件内表面辉光放电清洗电位分布图。

图3是实施例2中轴对称半封闭曲面工件内表面磁控溅射示意图。

图4是实施例2中象形辅助阳极的结构示意图。

图5是实施例2中轴对称半封闭曲面工件内表面辉光放电清洗电位分布图。

图6为实验验证中,轴对称半封闭曲面工件内表面结合强度测定拉头布置示意图。

图7是实施例1与实施例2所得轴对称半封闭曲面工件内表面镀层的结合强度测定结果图。

图中标记:1、真空室,2、轴对称半封闭曲面工件,3、象形辅助阳极,4、溅射靶,5、第一圆环,6、第二圆环,7、弧形连接杆,8、阳极连接杆。

具体实施方式

本说明书中公开的所有特征,或公开的所有方法或过程中的步骤,除了互相排斥的特征和/或步骤以外,均可以以任何方式组合。

本说明书中公开的任一特征,除非特别叙述,均可被其他等效或具有类似目的的替代特征加以替换。即,除非特别叙述,每个特征只是一系列等效或类似特征中的一个例子而已。

下面以内径Φ260mm的轴对称半封闭曲面工件内表面磁控溅射镀铜为例,通过对比实验来对本发明效果进行进一步说明,其中实施例1为无辅助阳极的传统方法,实施例2为有辅助阳极的本发明内容。

为了比较效果,除了发明中的辅助阳极外,其它设备、工装和工艺参数均相同。具体如下:平面磁控溅射靶直径为Φ240mm,靶面距离轴对称曲面工件口部100mm,靶功率3kW,工作氩气压0.3Pa,镀制时间1h。工艺过程中,轴对称半封闭曲面工件转动速度 3转/min,辅助阳极处于静止状态。

其中,轴对称半封闭曲面件内表面辉光放电清洗过程中的电位分布采用Ansys软件进行计算,镀层结合强度采用POSITEST结合强度测试仪进行测定。

实施例1

采用传统方法,将轴对称半封闭曲面工件口部向下正对靶面放置,且轴线重合,如图1所示。在辉光放电清洗过程中,工件附近的空间电位分布如图2所示。可以看出,轴对称半封闭曲面工件内部存在较大区域的等电位区,在该等电位区中,辉光放电产生的Ar+不能被加速获能,仅在初始动能下飞向工件表面,加之在飞行过程中与其它气体原子发生碰撞而发生能量衰减,致使达到工件表面的离子能量不足而难以使工件表面吸附的污染物有效去除,如此镀层原子难以与工件基体有效结合,并表现出镀层结合不足。

实施例2

采用本发明方法,轴对称半封闭曲面工件口部正对靶面,且轴线重合,在轴对称半封闭曲面工件内设置辅助阳极,其轴线与工件轴线重合,辅助阳极距离工件内表面3cm,如图3所示。为了不影响镀层沉积,辅助阳极为四条辐球形结构(如图4所示,该象形辅助阳极包括与轴对称半封闭曲面工件开口部相配合的第一圆环、与轴对称半封闭曲面工件内表面相配合的弧形连接杆、用于与电源相连的阳极连接杆、第二圆环,弧形连接杆的两端分别与第一圆环、第二圆环相连为一体,弧形连接杆为四个且均布于第一圆环与第二圆环之间,弧形连接杆与第一圆环、第二圆环连接为一体构成阳极主体,阳极主体与阳极连接杆相连)。在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连;在镀膜过程中,象形辅助阳极接地。在辉光放电清洗过程中,工件附近的空间电场分布如图5所示。可以看出,添加辅助阳极后,轴对称半封闭曲面工件内部等电位区显著缩小,从而克服了传统方法的不足。同时,在辅助阳极正电位的作用下,辅助阳极与轴对称半封闭曲面工件内表面的电场强度增加,在该区域中,辉光放电产生的Ar+被进一步加速获能,从而有效轰击工件表面而去除表面吸附的污染物,如此镀层原子可以与工件基体有效结合并表现出镀层结合的增强。

实验验证

采用上述辉光放电与镀层制备工艺参数,分别采用实施例1、实施例2的方法在碳钢轴对称半封闭曲面工件内表面进行铜镀层的制备,然后采用POSITEST结合强度测试仪进行镀层结合强度测定。测定结合强度的拉头布置如图6所示,拉头与镀层之间采用环氧树脂胶进行粘接,并在100℃下固化4h。除顶点外,其余每个纬度布置4个测量点,测定结合强度为同一纬度4个测定值的平均值,镀层结合强度测定结果如图7所示。通过图7可以看出,采用传统方法(实施例1)所得到的镀层结合强度随着轴对称半封闭曲面工件内表面纬度的增大而降低,其口部镀层结合强度约20MPa,而顶部仅有3MPa左右,这与辉光放电清洗过程中的电位分布有直接关系(由于电位分布的均匀性较差,辉光放电清洗过程中离子轰击作用差别显著,致使工件内形面顶部较口部的结合强度低很多);采用本发明方法(实施例2)所得到的镀层结合强度均匀性好且明显高于传统方法,且整个内表面不同部位镀层结合强度基本一致,约为20MPa,这是由于象形辅助阳极的添加显著改善了轴对称半封闭曲面工件内表面辉光放电清洗过程中的电位分布均匀性,各部位离子轰击作用一致且清洗效果良好。

综上所述,镀层结合强度测定结果表明,本发明能显著提高轴对称半封闭曲面工件内表面磁控溅射镀层的结合强度。

本发明并不局限于前述的具体实施方式。本发明扩展到任何在本说明书中披露的新特征或任何新的组合,以及披露的任一新的方法或过程的步骤或任何新的组合。

【EN】

A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhance combination method and

It is applied

Technical field

The present invention relates to coating preparation field, especially magnetron sputtering coating binding performances to enhance field, specially a kind of

The Enhancement Method of the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding performance of axial symmetry.

Background technique

Magnetron sputtering is a kind of industrialization plating layer deposition techniques, its working principles are as follows: electronics is in the orthogonal electricity of sputtering target surface

It spins in magnetic field movement, and collides with working gas (such as argon gas), making working gas ionization is ion (such as argon ion),

Ion accelerates under the electric field action of sputter cathode, and the kinetic energy of target surface is flown in capacitation, and is collided with target surface atom, and makes target

Material atom is sputtered out, and the target atom for being sputtered out deposits to workpiece surface, and forms coating.It is answered to meet engineering

With needing preferable binding performance between magnetron sputtering coating and matrix.

In magnetron sputtering coating preparation process, in order to make to have between coating and matrix preferable binding performance, usually

It needs to carry out Glow Discharge Cleaning under certain back bias voltage to matrix.During Glow Discharge Cleaning, in workpiece surface negative bias

Under the action of piezoelectric field, the ion in glow discharge plasma flies to workpiece, and bombards with workpiece surface, passes through momentum

Transmitting is to remove workpiece surface polluter, to obtain clean surface.Wherein, the ion bombardment during Glow Discharge Cleaning

It is an important factor for enhancing magnetron sputtering coating is in conjunction with matrix.

For common plane, cylindric, convex surface workpiece, ion bombardment effect in Glow Discharge Cleaning and coating process compared with

Good, magnetron sputtering coating and matrix usually have preferable binding performance.But curved-surface piece inner surface semiclosed for axial symmetry, by

During Glow Discharge Cleaning there is " Faraday cup " effect (as shown in Figure 2) in field distribution, Glow Discharge Cleaning and plated film

Ion bombardment effects in the process are concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, electric field remoter away from oral area

Weaker, ion bombardment effect is poorer, and then causes coating weaker in conjunction with matrix, in addition there is coating and matrix is not bound with and

The phenomenon that being bubbled, or even falling off.

In practical engineering applications, the coating of workpiece surface usually has the special surfaces function such as decoration, wear-resisting, anticorrosion

Can, coating deficiency in conjunction with matrix will influence the surface property of workpiece after coating.

For this purpose, there is an urgent need to a kind of new devices and/or method, to solve the above problems.

Summary of the invention

Goal of the invention of the invention is: carrying out brightness to the semiclosed curved-surface piece inner surface of axial symmetry for using existing method

When light Discharge Cleaning, based on " Faraday cup " effect existing for field distribution, cause in Glow Discharge Cleaning and coating process

Ion bombardment effects are concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, and remoter away from oral area, electric field is weaker, ion

Bombardment effect is poorer, and leads to coating and the weaker problem of matrix binding ability, provides in a kind of semiclosed curved-surface piece of axial symmetry

Overlay coating uniformly enhances physical gas-phase deposite method and its application of combination.The present invention changes axis by pictograph impressed current anode

The field distribution of symmetrical semiclosed curve surface work pieces inner surface, thus the ion bombardment effects during enhancing Glow Discharge Cleaning,

Obtain workpiece clean surface before plating, the combination of the final effectively enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry

Performance.Of the invention is easy to operate, and technique is controllable, favorable repeatability, can satisfy the need of industrialization large-scale production and application

It wants, effectively realizes the firm connection between the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry and matrix, significantly mention

It is horizontal to rise equipment manufacturing, application value with higher and preferable application prospect.

To achieve the goals above, the present invention adopts the following technical scheme:

A kind of method that semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, includes the following steps:

(1) opening portion of the semiclosed curve surface work pieces of axial symmetry is arranged downward, and circular flat magnetic controlled sputtering target is arranged

Below the semiclosed curve surface work pieces of axial symmetry, and the axis phase of the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target

It is overlapped, is maintained a certain distance between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target;

(2) one and the semiclosed curve surface work pieces inner surface of axial symmetry are set in the opening portion of the semiclosed curve surface work pieces of axial symmetry

The pictograph impressed current anode matched, and the axis of pictograph impressed current anode is overlapped with the axis of circular flat magnetic controlled sputtering target;

(3) pictograph impressed current anode and the semiclosed curve surface work pieces of axial symmetry are relatively rotated, physical vapour deposition (PVD) is carried out, works as plating

After layer reaches setting value.

In the step 3, carrying out physical vapour deposition (PVD) includes: Glow Discharge Cleaning process, coating process;In glow discharge

In cleaning process, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode ground connection;Work as coating

After reaching setting value.

In the step 3, pictograph impressed current anode is static, and the semiclosed curve surface work pieces of axial symmetry are rotated along its axis;

Or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode is rotated along its axis;

Or using the axis of the semiclosed curve surface work pieces of axial symmetry as rotary shaft, the semiclosed curve surface work pieces of axial symmetry and pictograph are assisted

Anode is relatively rotated along rotary shaft.

In the step 1, gap is formed between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target.

In the step 2, pictograph impressed current anode includes first matched with the semiclosed curve surface work pieces opening portion of axial symmetry

Annulus, the arc-shaped connecting rod matched with the semiclosed curve surface work pieces inner surface of axial symmetry, anode connecting rod, the arc-shaped connecting rod

For at least two and arc-shaped connecting rod and the first annulus are connected as one composition anode body, and the anode body is connect with anode

Bar is connected.

It further include the second annulus, the both ends of the arc-shaped connecting rod are connected as one with the first annulus, the second annulus respectively.

The arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus.

The application of preceding method, the coating for being used for axisymmetric curved surface work piece inner surface band bias uniformly enhance combination

Physical vapour deposition (PVD).

It is used for the magnetron sputtering preparation semiclosed curved-surface piece inner surface coating of axial symmetry.

It is poor and uneven in order to solve the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding performance of existing axial symmetry

The technical issues of, the present invention provides a kind of method that the semiclosed curved-surface piece inner surface coating of axial symmetry uniformly enhances combination, specifically

For a kind of Enhancement Method of the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding performance of axial symmetry.This method includes as follows

Step: the semiclosed curve surface work pieces oral area of axial symmetry is placed downward, circular flat magnetic controlled sputtering target is disposed below, the two axis

It is overlapped, target and the semiclosed curve surface work pieces oral area of axial symmetry keep certain distance;Oral area is put in the semiclosed curve surface work pieces of axial symmetry

A pictograph impressed current anode is set, and its axis is overlapped with axis of workpiece;During the deposition process, pictograph impressed current anode is static, axial symmetry

Semiclosed curve surface work pieces are rotated along axis of workpiece or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode is along axis

Rotation.During Glow Discharge Cleaning, pictograph impressed current anode is connected with power anode.In the present invention, by axial symmetry

Impressed current anode, the semiclosed curve surface work pieces inner surface electricity of Lai Gaishan technical process formed symmetrical is arranged in semiclosed curve surface work pieces inner surface

The uniformity of bit distribution acts on to enhance uniform bombardment of the Glow Discharge Cleaning process intermediate ion at each position.I.e. in workpiece

Before plating during Glow Discharge Cleaning, improved in the semiclosed curve surface work pieces of axial symmetry by applying positive potential on impressed current anode

The uniformity of surface potential distribution achievees the purpose that effectively uniformly to clean, most so as to improve the uniformity of each position ion bombardment

The bond strength of the enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry eventually.

Present invention coating with bias suitable for axisymmetric curved surface work piece inner surface technical process uniformly enhances combination

Physical vapour deposition (PVD), and it is not limited only to magnetron sputtering technique.

Further, the present invention provides a kind of specific structure of pictograph impressed current anode.The pictograph impressed current anode includes and axis pair

The first annulus for claiming semiclosed curve surface work pieces opening portion to match, the arc matched with the semiclosed curve surface work pieces inner surface of axial symmetry

Shape connecting rod, the anode connecting rod for being connected with power supply, arc-shaped connecting rod is at least two and arc-shaped connecting rod and first is justified

Ring is connected as one composition anode body, and anode body is connected with anode connecting rod.The structure preparation pictograph impressed current anode with

The inner surface of the semiclosed curve surface work pieces of axial symmetry is consistent, and structure is simple, and production cost is low, and can effectively solve of the invention

Technical problem.

Further, which further includes the second annulus, the both ends of arc-shaped connecting rod respectively with the first annulus,

Two annulus are connected as one.The present invention is cooperated using the first annulus, the second annulus, is conducive to adding for pictograph impressed current anode

Work and manufacture reduce production cost.

In a specific example, arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus;It will

The semiclosed curve surface work pieces oral area of axial symmetry is placed downward, and circular flat magnetic controlled sputtering target is disposed below, and the two axis is overlapped, target

Certain distance (target-cardinal distance) is kept with axisymmetric curved surface oral area;Placed inside axisymmetric curved surface one and work piece inner surface as

The impressed current anode of shape, axis are overlapped with axis of workpiece, and impressed current anode is 3 cm at a distance from work piece inner surface;In glow discharge

In cleaning process, the air pressure of argon working gas is 2.0 Pa, and workpiece bias is -800V, and impressed current anode voltage is+50V, cleaning

Time 30min;In coating process, impressed current anode ground connection;In technical process, workpiece keeps rotation, and pictograph impressed current anode is protected

It holds static.

The present invention changes the field distribution of the semiclosed curve surface work pieces inner surface of axial symmetry by pictograph impressed current anode, thus

Enhance the ion bombardment effects during Glow Discharge Cleaning, obtains workpiece clean surface before plating, final effectively enhancing axial symmetry

The binding performance of semiclosed curve surface work pieces inner surface magnetron sputtering coating.After measured, the present invention can be by the axis pair of internal diameter Φ 260mm

Claim semiclosed curve surface work pieces inner surface magnetron sputtering coating bond strength to greatly improve about 20MPa by minimum about 3MPa, has

Significant technological progress.

In conclusion the present invention can effectively overcome the shortcomings of conventional method, the table in the semiclosed curve surface work pieces of axial symmetry

The firm connection between magnetron sputtering coating and matrix is realized in face, and method is simple, and technique is controllable, and process is short, high treating effect.

Practice further demonstrates that the method can significantly improve the combination of the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry is strong

Degree, application value with higher.

Detailed description of the invention

Examples of the present invention will be described by way of reference to the accompanying drawings, in which:

Fig. 1 is the semiclosed curve surface work pieces inner surface magnetron sputtering schematic diagram of conventional method axial symmetry.

Fig. 2 is the semiclosed curve surface work pieces inner surface Glow Discharge Cleaning potential image of conventional method axial symmetry.

Fig. 3 is the semiclosed curve surface work pieces inner surface magnetron sputtering schematic diagram of 2 formed symmetrical of embodiment.

Fig. 4 is the structural schematic diagram of pictograph impressed current anode in embodiment 2.

Fig. 5 is the semiclosed curve surface work pieces inner surface Glow Discharge Cleaning potential image of 2 formed symmetrical of embodiment.

Fig. 6 is in experimental verification, and the semiclosed curve surface work pieces inner surface bond strength of axial symmetry measures pull head arrangement schematic diagram.

Fig. 7 is the bond strength measurement of embodiment 1 and the semiclosed curve surface work pieces inner surface coating of 2 gained axial symmetry of embodiment

Result figure.

Marked in the figure: 1, vacuum chamber, 2, the semiclosed curve surface work pieces of axial symmetry, 3, pictograph impressed current anode, 4, sputtering target, 5,

One annulus, the 6, second annulus, 7, arc-shaped connecting rod, 8, anode connecting rod.

Specific embodiment

All features disclosed in this specification or disclosed all methods or in the process the step of, in addition to mutually exclusive

Feature and/or step other than, can combine in any way.

Any feature disclosed in this specification unless specifically stated can be equivalent or with similar purpose by other

Alternative features are replaced.That is, unless specifically stated, each feature is an example in a series of equivalent or similar characteristics

?.

Below by taking the semiclosed curve surface work pieces inner surface magnetron sputtering copper facing of the axial symmetry of internal diameter Φ 260mm as an example, by right

Effect of the present invention is further described than testing, wherein embodiment 1 is the conventional method without impressed current anode, embodiment 2

To there is the content of present invention of impressed current anode.

For comparative effectiveness, other than the impressed current anode in invention, other equipment, tooling and technological parameter are all the same.Tool

Body is as follows: plane magnetic controlled sputtering target diameter is Φ 240mm, target surface apart from axisymmetric curved surface workpiece oral area 100mm, target power output 3kW,

Work Ar Pressure 0.3Pa, is coated with time 1h.In technical process, axial symmetry semiclosed 3 turns/min of curve surface work pieces velocity of rotation is auxiliary

Supporing yang pole remains static.

Wherein, the Potential distribution during the semiclosed curved-surface piece inner surface Glow Discharge Cleaning of axial symmetry is soft using Ansys

Part is calculated, and coat binding strength is measured using POSITEST bond strength tester.

Embodiment 1

Using conventional method, the downward face target surface of the semiclosed curve surface work pieces oral area of axial symmetry is placed, and axis is overlapped, such as

Shown in Fig. 1.During Glow Discharge Cleaning, the space potential distribution of near workpieces is as shown in Figure 2.It can be seen that axial symmetry

There are the equipotential regions of large area inside semiclosed curve surface work pieces, and in the equipotential region, the Ar+ that glow discharge generates cannot

Accelerated capacitation, workpiece surface is only flown under initial kinetic energy, is collided in flight course with other gas atoms in addition

And energy attenuation occurs, cause the ion energy for reaching workpiece surface insufficient and is difficult to keep the pollutant of workpiece surface absorption effective

Removal, such coating atom are difficult to effectively be combined with workpiece substrate, and show coating and combine deficiency.

Embodiment 2

Using the method for the present invention, the semiclosed curve surface work pieces oral area face target surface of axial symmetry, and axis is overlapped, in axial symmetry half

Impressed current anode is set in closed surface workpiece, and axis is overlapped with axis of workpiece, and impressed current anode is apart from work piece inner surface 3cm, such as

Shown in Fig. 3.In order to not influence coating deposition, impressed current anode is four spoke spherical structures (as shown in figure 4, the pictograph impressed current anode

Including the first annulus matched with the semiclosed curve surface work pieces opening portion of axial symmetry and the semiclosed curve surface work pieces inner surface of axial symmetry

The arc-shaped connecting rod matched, the anode connecting rod for being connected with power supply, the second annulus, the both ends of arc-shaped connecting rod respectively with

First annulus, the second annulus are connected as one, and arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus, arc

Shape connecting rod and the first annulus, the second annulus are connected as one composition anode body, and anode body is connected with anode connecting rod).

During Glow Discharge Cleaning, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode is connect

Ground.During Glow Discharge Cleaning, the space electric field distribution of near workpieces is as shown in Figure 5.As can be seen that addition impressed current anode

Afterwards, equipotential region is reduced significantly inside the semiclosed curve surface work pieces of axial symmetry, to overcome the deficiency of conventional method.Meanwhile

Under the action of impressed current anode positive potential, the electric field strength of impressed current anode and the semiclosed curve surface work pieces inner surface of axial symmetry increases,

In the region, the Ar+ that glow discharge generates is further accelerated capacitation, to effectively bombard workpiece surface and remove adsorption

Pollutant, such coating atom can effectively be combined with workpiece substrate and show the enhancing in conjunction with coating.

Experimental verification

Using above-mentioned glow discharge and technique for preparing coating parameter, embodiment 1, the method for embodiment 2 is respectively adopted in carbon

Symmetrically semiclosed curve surface work pieces inner surface carries out the preparation of copper coating to steel shaft, then using POSITEST bond strength tester into

The measurement of row coat binding strength.The pull head arrangement of bond strength is measured as shown in fig. 6, using epoxy resin between pull head and coating

Glue is bonded, and solidifies 4h at 100 DEG C.In addition to vertex, remaining each latitude arranges 4 measurement points, measures bond strength

For the average value of 4 measured values of Same Latitude, coat binding strength measurement result is as shown in Figure 7.As seen in Figure 7, it adopts

With conventional method (embodiment 1) obtained coat binding strength with the increasing of the semiclosed curve surface work pieces inner surface latitude of axial symmetry

It is big and reduce, oral area coat binding strength about 20MPa, and top only has 3MPa or so, this with during Glow Discharge Cleaning

Potential distribution have direct relation (since the uniformity of Potential distribution is poor, ion bombardment effects during Glow Discharge Cleaning

Significant difference causes much lower compared with the bond strength of oral area at the top of shape face in workpiece);Using the method for the present invention (embodiment 2) institute

Obtained coat binding strength uniformity is good and is apparently higher than conventional method, and entire inner surface different parts coat binding strength

It is almost the same, about 20MPa, this is because the addition of pictograph impressed current anode significantly improves in the semiclosed curve surface work pieces of axial symmetry

Potential distribution uniformity during the Glow Discharge Cleaning of surface, each position ion bombardment effects are consistent and cleaning effect is good.

In conclusion coat binding strength measurement result shows that the method can significantly improve the semiclosed curved surface works of axial symmetry

The bond strength of part inner surface magnetron sputtering coating.

The invention is not limited to specific embodiments above-mentioned.The present invention, which expands to, any in the present specification to be disclosed

New feature or any new combination, and disclose any new method or process the step of or any new combination.

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