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一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法及其应用 【EN】A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly strengthens the method and its application of combination

申请(专利)号:CN201711046343.1国省代码:四川 51
申请(专利权)人:【中文】中国工程物理研究院材料研究所【EN】Inst. of Materials, Chinese Academy of Engineering Physics
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摘要:
【中文】本发明公开了一种轴对称半封闭曲面件内表面镀层均匀增强结合的物理气相沉积方法及其应用,目的在于解决采用现有方法对轴对称半封闭曲面件内表面进行辉光放电清洗时,基于电场分布存在的“法拉第杯”效应,导致辉光放电清洗与镀膜过程中的离子轰击作用主要集中在轴对称半封闭曲面件内表面的口部,并导致轴对称半封闭曲面件内表面其余部位镀层与基体结合能力较弱的问题。本发明通过象形辅助阳极来改变轴对称半封闭曲面工件内表面的电场分布,从而增强辉光放电清洗过程中的离子轰击作用,获得镀前工件洁净表面,最终有效增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合性能。本发明能有效实现轴对称半封闭曲面工件内表面磁控溅射镀层与基体之间的均匀增强结合,显著提升装备制造水平。 【EN】Paragraph:The invention discloses physical gas-phase deposite method and its application that a kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly strengthens combination, when purpose is to solve to carry out Glow Discharge Cleaning to the semiclosed curved-surface piece inner surface of axial symmetry using existing method, based on " Faraday cup " effect existing for Electric Field Distribution, the problem of causing Glow Discharge Cleaning to be concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry with the ion bombardment effects in coating process, and causing remaining position coating of the semiclosed curved-surface piece inner surface of axial symmetry and weaker matrix binding ability.The present invention changes the Electric Field Distribution of the semiclosed curve surface work pieces inner surface of axial symmetry by pictograph impressed current anode, so as to strengthen the ion bombardment effects during Glow Discharge Cleaning, workpiece clean surface before being plated, the binding ability of the final effectively enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry.The present invention can effectively realize that the uniform enhancing between the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry and matrix is combined, and be obviously improved equipment manufacturing level.Image:201711046343.GIF

主权项:
【中文】1.一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法,其特征在于,包括如下步骤: (1)将轴对称半封闭曲面工件的开口部朝下设置,并将圆形平面磁控溅射靶设置于轴对称半封闭曲面工件下方,且轴对称半封闭曲面工件与圆形平面磁控溅射靶的轴线相重合,轴对称半封闭曲面工件与圆形平面磁控溅射靶之间保持一定的距离; (2)在轴对称半封闭曲面工件的开口部设置一个与轴对称半封闭曲面工件内表面相配合的象形辅助阳极,且象形辅助阳极的轴线与圆形平面磁控溅射靶的轴线重合; (3)使象形辅助阳极与轴对称半封闭曲面工件相对转动,进行物理气相沉积,当镀层达到设定值后,即可。 【EN】1. a kind of method that semiclosed curved-surface piece inner surface coating of axial symmetry uniformly strengthens combination, it is characterised in that including as follows Step: (1)The opening portion of the semiclosed curve surface work pieces of axial symmetry is set down, and circular flat magnetic controlled sputtering target is arranged at axle Below symmetrical semiclosed curve surface work pieces, and the semiclosed curve surface work pieces of axial symmetry are mutually overlapping with the axis of circular flat magnetic controlled sputtering target Close, maintained a certain distance between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target; (2)One is set to match with the semiclosed curve surface work pieces inner surface of axial symmetry in the opening portion of the semiclosed curve surface work pieces of axial symmetry The pictograph impressed current anode of conjunction, and the axis of pictograph impressed current anode overlaps with the axis of circular flat magnetic controlled sputtering target; (3)Pictograph impressed current anode is relatively rotated with the semiclosed curve surface work pieces of axial symmetry, physical vapour deposition (PVD) is carried out, when coating reaches To after setting value, you can.


说明书

【中文】

一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法及

其应用

技术领域

本发明涉及镀层制备领域,尤其是磁控溅射镀层结合性能增强领域,具体为一种轴对称半封闭曲面工件内表面磁控溅射镀层结合性能的增强方法。

背景技术

磁控溅射是一种工业化镀层沉积技术,其工作原理如下:电子在溅射靶面正交电磁场中做螺旋运动,并与工作气体(如氩气)发生碰撞,使工作气体电离为离子(如氩离子),离子在溅射阴极的电场作用下加速,获能飞向靶面的动能,并与靶面原子发生碰撞,而使靶材原子被溅射出来,被溅射出来的靶材原子沉积到工件表面,而形成镀层。为了满足工程应用,磁控溅射镀层与基体之间需要有较好的结合性能。

在磁控溅射镀层制备过程中,为了使镀层与基体之间具有较好的结合性能,通常需要对基体在一定负偏压下进行辉光放电清洗。在辉光放电清洗过程中,在工件表面负偏压电场的作用下,辉光放电等离子体中的离子飞向工件,并与工件表面发生轰击,通过动量传递来去除工件表面污染物质,从而获取洁净表面。其中,辉光放电清洗过程中的离子轰击是增强磁控溅射镀层与基体结合的重要因素。

对于普通平面、圆柱状、凸面工件,辉光放电清洗与镀膜过程中的离子轰击效果较好,磁控溅射镀层与基体通常具有较好的结合性能。但对于轴对称半封闭曲面件内表面,由于辉光放电清洗过程中电场分布存在“法拉第杯”效应(如图2所示),辉光放电清洗与镀膜过程中的离子轰击作用主要集中在轴对称半封闭曲面件内表面的口部,距口部越远,电场越弱,离子轰击效果越差,进而导致镀层与基体结合越弱,甚至出现镀层与基体没有结合而鼓泡,甚至脱落的现象。

在实际工程应用中,工件表面的镀层通常具有装饰、耐磨、防腐蚀等特殊表面功能,镀层与基体结合不足必将影响到镀层后工件的表面性能。

为此,迫切需要一种新的装置和/或方法,以解决上述问题。

发明内容

本发明的发明目的在于:针对采用现有方法对轴对称半封闭曲面件内表面进行辉光放电清洗时,基于电场分布存在的“法拉第杯”效应,导致辉光放电清洗与镀膜过程中的离子轰击作用主要集中在轴对称半封闭曲面件内表面的口部,距口部越远,电场越弱,离子轰击效果越差,并导致镀层与基体结合能力较弱的问题,提供一种轴对称半封闭曲面件内表面镀层均匀增强结合的物理气相沉积方法及其应用。本发明通过象形辅助阳极来改变轴对称半封闭曲面工件内表面的电场分布,从而增强辉光放电清洗过程中的离子轰击作用,获得镀前工件洁净表面,最终有效增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合性能。本发明的操作简单,工艺可控,可重复性好,能够满足工业化大规模生产和应用的需要,有效实现轴对称半封闭曲面工件内表面磁控溅射镀层与基体之间的牢固结合,显著提升装备制造水平,具有较高的应用价值和较好的应用前景。

为了实现上述目的,本发明采用如下技术方案:

一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法,包括如下步骤:

(1)将轴对称半封闭曲面工件的开口部朝下设置,并将圆形平面磁控溅射靶设置于轴对称半封闭曲面工件下方,且轴对称半封闭曲面工件与圆形平面磁控溅射靶的轴线相重合,轴对称半封闭曲面工件与圆形平面磁控溅射靶之间保持一定的距离;

(2)在轴对称半封闭曲面工件的开口部设置一个与轴对称半封闭曲面工件内表面相配合的象形辅助阳极,且象形辅助阳极的轴线与圆形平面磁控溅射靶的轴线重合;

(3)使象形辅助阳极与轴对称半封闭曲面工件相对转动,进行物理气相沉积,当镀层达到设定值后,即可。

所述步骤3中,进行物理气相沉积包括:辉光放电清洗过程、镀膜过程;在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连;在镀膜过程中,象形辅助阳极接地;当镀层达到设定值后,即可。

所述步骤3中,象形辅助阳极静止,轴对称半封闭曲面工件沿其轴线转动;

或轴对称半封闭曲面工件静止,象形辅助阳极沿其轴线转动;

或以轴对称半封闭曲面工件的轴线为旋转轴,轴对称半封闭曲面工件与象形辅助阳极沿旋转轴相对转动。

所述步骤1中,轴对称半封闭曲面工件与圆形平面磁控溅射靶之间形成间隙。

所述步骤2中,象形辅助阳极包括与轴对称半封闭曲面工件开口部相配合的第一圆环、与轴对称半封闭曲面工件内表面相配合的弧形连接杆、阳极连接杆,所述弧形连接杆为至少两个且弧形连接杆与第一圆环连接为一体构成阳极主体,所述阳极主体与阳极连接杆相连。

还包括第二圆环,所述弧形连接杆的两端分别与第一圆环、第二圆环相连为一体。

所述弧形连接杆为四个且均布于第一圆环与第二圆环之间。

前述方法的应用,将其用于轴对称曲面工件内表面带偏压的镀层均匀增强结合的物理气相沉积。

将其用于磁控溅射制备轴对称半封闭曲面件内表面镀层。

为了解决现有轴对称半封闭曲面工件内表面磁控溅射镀层结合性能较差且不均的技术问题,本发明提供一种轴对称半封闭曲面件内表面镀层均匀增强结合的方法,具体为一种轴对称半封闭曲面工件内表面磁控溅射镀层结合性能的增强方法。该方法包括如下步骤:将轴对称半封闭曲面工件口部朝下放置,圆形平面磁控溅射靶位于其下方,二者轴线重合,靶与轴对称半封闭曲面工件口部保持一定距离;在轴对称半封闭曲面工件内口部放置一象形辅助阳极,且其轴线与工件轴线重合;在沉积过程中,象形辅助阳极静止、轴对称半封闭曲面工件沿工件轴线转动,或者轴对称半封闭曲面工件静止、象形辅助阳极沿轴线转动。在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连。本发明中,通过在轴对称半封闭曲面工件内表面设置辅助阳极,来改善工艺过程中轴对称半封闭曲面工件内表面电位分布的均匀性,从而增强辉光放电清洗过程中离子在各部位的均匀轰击作用。即在工件镀前辉光放电清洗过程中,通过在辅助阳极上施加正电位来改善轴对称半封闭曲面工件内表面电位分布的均匀性,从而改善各部位离子轰击的均匀性,达到有效均匀清洗的目的,最终增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合强度。

本发明适用于轴对称曲面工件内表面工艺过程中带偏压的镀层均匀增强结合的物理气相沉积,且不仅限于磁控溅射技术。

进一步,本发明提供一种象形辅助阳极的具体结构。该象形辅助阳极包括与轴对称半封闭曲面工件开口部相配合的第一圆环、与轴对称半封闭曲面工件内表面相配合的弧形连接杆、用于与电源相连的阳极连接杆,弧形连接杆为至少两个且弧形连接杆与第一圆环连接为一体构成阳极主体,阳极主体与阳极连接杆相连。该结构制备的象形辅助阳极与轴对称半封闭曲面工件的内表面相一致,且结构简单,生产成本低,并能有效解决本发明的技术问题。

进一步,该象形辅助阳极还包括第二圆环,弧形连接杆的两端分别与第一圆环、第二圆环相连为一体。本发明采用第一圆环、第二圆环相互配合,其有利于象形辅助阳极的加工和制造,降低生产成本。

在一个具体的实例中,弧形连接杆为四个且均布于第一圆环与第二圆环之间;将轴对称半封闭曲面工件口部朝下放置,圆形平面磁控溅射靶位于其下方,二者轴线重合,靶与轴对称曲面口部保持一定距离(靶-基距);在轴对称曲面内部放置一个与工件内表面象形的辅助阳极,其轴线与工件轴线重合,辅助阳极与工件内表面的距离为3 cm;在辉光放电清洗过程中,工作气体氩气的气压为2.0 Pa,工件偏压为-800V,辅助阳极电压为+50V,清洗时间30min;在镀膜过程中,辅助阳极接地;工艺过程中,工件保持转动,而象形辅助阳极保持静止。

本发明通过象形辅助阳极来改变轴对称半封闭曲面工件内表面的电场分布,从而增强辉光放电清洗过程中的离子轰击作用,获得镀前工件洁净表面,最终有效增强轴对称半封闭曲面工件内表面磁控溅射镀层的结合性能。经测定,本发明能将内径Φ260mm的轴对称半封闭曲面工件内表面磁控溅射镀层结合强度由最小约3MPa大幅提高到约20MPa,具有显著的技术进步。

综上所述,本发明能够有效克服传统方法的不足,在轴对称半封闭曲面工件内表面实现磁控溅射镀层与基体之间的牢固结合,其方法简单,工艺可控,流程短,处理效果好。实践进一步表明,本发明能显著提高轴对称半封闭曲面工件内表面磁控溅射镀层的结合强度,具有较高的应用价值。

附图说明

本发明将通过例子并参照附图的方式说明,其中:

图1为传统方法轴对称半封闭曲面工件内表面磁控溅射示意图。

图2为传统方法轴对称半封闭曲面工件内表面辉光放电清洗电位分布图。

图3是实施例2中轴对称半封闭曲面工件内表面磁控溅射示意图。

图4是实施例2中象形辅助阳极的结构示意图。

图5是实施例2中轴对称半封闭曲面工件内表面辉光放电清洗电位分布图。

图6为实验验证中,轴对称半封闭曲面工件内表面结合强度测定拉头布置示意图。

图7是实施例1与实施例2所得轴对称半封闭曲面工件内表面镀层的结合强度测定结果图。

图中标记:1、真空室,2、轴对称半封闭曲面工件,3、象形辅助阳极,4、溅射靶,5、第一圆环,6、第二圆环,7、弧形连接杆,8、阳极连接杆。

具体实施方式

本说明书中公开的所有特征,或公开的所有方法或过程中的步骤,除了互相排斥的特征和/或步骤以外,均可以以任何方式组合。

本说明书中公开的任一特征,除非特别叙述,均可被其他等效或具有类似目的的替代特征加以替换。即,除非特别叙述,每个特征只是一系列等效或类似特征中的一个例子而已。

下面以内径Φ260mm的轴对称半封闭曲面工件内表面磁控溅射镀铜为例,通过对比实验来对本发明效果进行进一步说明,其中实施例1为无辅助阳极的传统方法,实施例2为有辅助阳极的本发明内容。

为了比较效果,除了发明中的辅助阳极外,其它设备、工装和工艺参数均相同。具体如下:平面磁控溅射靶直径为Φ240mm,靶面距离轴对称曲面工件口部100mm,靶功率3kW,工作氩气压0.3Pa,镀制时间1h。工艺过程中,轴对称半封闭曲面工件转动速度 3转/min,辅助阳极处于静止状态。

其中,轴对称半封闭曲面件内表面辉光放电清洗过程中的电位分布采用Ansys软件进行计算,镀层结合强度采用POSITEST结合强度测试仪进行测定。

实施例1

采用传统方法,将轴对称半封闭曲面工件口部向下正对靶面放置,且轴线重合,如图1所示。在辉光放电清洗过程中,工件附近的空间电位分布如图2所示。可以看出,轴对称半封闭曲面工件内部存在较大区域的等电位区,在该等电位区中,辉光放电产生的Ar+不能被加速获能,仅在初始动能下飞向工件表面,加之在飞行过程中与其它气体原子发生碰撞而发生能量衰减,致使达到工件表面的离子能量不足而难以使工件表面吸附的污染物有效去除,如此镀层原子难以与工件基体有效结合,并表现出镀层结合不足。

实施例2

采用本发明方法,轴对称半封闭曲面工件口部正对靶面,且轴线重合,在轴对称半封闭曲面工件内设置辅助阳极,其轴线与工件轴线重合,辅助阳极距离工件内表面3cm,如图3所示。为了不影响镀层沉积,辅助阳极为四条辐球形结构(如图4所示,该象形辅助阳极包括与轴对称半封闭曲面工件开口部相配合的第一圆环、与轴对称半封闭曲面工件内表面相配合的弧形连接杆、用于与电源相连的阳极连接杆、第二圆环,弧形连接杆的两端分别与第一圆环、第二圆环相连为一体,弧形连接杆为四个且均布于第一圆环与第二圆环之间,弧形连接杆与第一圆环、第二圆环连接为一体构成阳极主体,阳极主体与阳极连接杆相连)。在辉光放电清洗过程中,将象形辅助阳极与电源阳极相连;在镀膜过程中,象形辅助阳极接地。在辉光放电清洗过程中,工件附近的空间电场分布如图5所示。可以看出,添加辅助阳极后,轴对称半封闭曲面工件内部等电位区显著缩小,从而克服了传统方法的不足。同时,在辅助阳极正电位的作用下,辅助阳极与轴对称半封闭曲面工件内表面的电场强度增加,在该区域中,辉光放电产生的Ar+被进一步加速获能,从而有效轰击工件表面而去除表面吸附的污染物,如此镀层原子可以与工件基体有效结合并表现出镀层结合的增强。

实验验证

采用上述辉光放电与镀层制备工艺参数,分别采用实施例1、实施例2的方法在碳钢轴对称半封闭曲面工件内表面进行铜镀层的制备,然后采用POSITEST结合强度测试仪进行镀层结合强度测定。测定结合强度的拉头布置如图6所示,拉头与镀层之间采用环氧树脂胶进行粘接,并在100℃下固化4h。除顶点外,其余每个纬度布置4个测量点,测定结合强度为同一纬度4个测定值的平均值,镀层结合强度测定结果如图7所示。通过图7可以看出,采用传统方法(实施例1)所得到的镀层结合强度随着轴对称半封闭曲面工件内表面纬度的增大而降低,其口部镀层结合强度约20MPa,而顶部仅有3MPa左右,这与辉光放电清洗过程中的电位分布有直接关系(由于电位分布的均匀性较差,辉光放电清洗过程中离子轰击作用差别显著,致使工件内形面顶部较口部的结合强度低很多);采用本发明方法(实施例2)所得到的镀层结合强度均匀性好且明显高于传统方法,且整个内表面不同部位镀层结合强度基本一致,约为20MPa,这是由于象形辅助阳极的添加显著改善了轴对称半封闭曲面工件内表面辉光放电清洗过程中的电位分布均匀性,各部位离子轰击作用一致且清洗效果良好。

综上所述,镀层结合强度测定结果表明,本发明能显著提高轴对称半封闭曲面工件内表面磁控溅射镀层的结合强度。

本发明并不局限于前述的具体实施方式。本发明扩展到任何在本说明书中披露的新特征或任何新的组合,以及披露的任一新的方法或过程的步骤或任何新的组合。

【EN】

A kind of semiclosed curved-surface piece inner surface coating of axial symmetry uniformly strengthen combination method and

It is applied

Technical field

It is specially one kind the present invention relates to coating preparation field, especially magnetron sputtering coating binding ability enhancing field

The Enhancement Method of the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding ability of axial symmetry.

Background technology

Magnetron sputtering is a kind of industrialization plating layer deposition techniques, and its operation principle is as follows:Electronics is in the sputtering orthogonal electricity of target surface

Spinned in magnetic field motion, and and working gas(Such as argon gas)Collide, it is ion to make working gas ionization(Such as argon ion),

Ion accelerates under the electric field action of sputter cathode, and the kinetic energy of target surface is flown in capacitation, and is collided with target surface atom, and makes target

Material atom is sputtered out, and the target atom for being sputtered out deposits to workpiece surface, and forms coating.In order to meet that engineering should

With needing preferable binding ability between magnetron sputtering coating and matrix.

In magnetron sputtering coating preparation process, in order that there is preferable binding ability, generally between coating and matrix

Need to carry out Glow Discharge Cleaning under certain back bias voltage to matrix.During Glow Discharge Cleaning, in workpiece surface negative bias

In the presence of piezoelectric field, the ion in glow discharge plasma flies to workpiece, and is bombarded with workpiece surface, passes through momentum

Transmit to remove workpiece surface polluter, so as to obtain clean surface.Wherein, the Ions Bombardment during Glow Discharge Cleaning

It is an important factor for enhancing magnetron sputtering coating is combined with matrix.

For common plane, cylindric, convex surface workpiece, Glow Discharge Cleaning and the Ions Bombardment effect in coating process compared with

Good, magnetron sputtering coating generally has preferable binding ability with matrix.But for the semiclosed curved-surface piece inner surface of axial symmetry, by

During Glow Discharge Cleaning there is " Faraday cup " effect in Electric Field Distribution(As shown in Figure 2), Glow Discharge Cleaning and plated film

During ion bombardment effects be concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, electric field more remote away from oral area

Weaker, Ions Bombardment effect is poorer, and then it is weaker to cause coating to be combined with matrix, in addition occur coating and matrix be not bound with and

Bubbling, or even the phenomenon to come off.

In practical engineering application, the coating of workpiece surface generally has the special surface work(such as decoration, wear-resisting, anticorrosion

Can, coating, which is combined deficiency with matrix, will have influence on the surface property of workpiece after coating.

Therefore, there is an urgent need to a kind of new device and/or method, to solve the above problems.

The content of the invention

The goal of the invention of the present invention is:For carrying out brightness to the semiclosed curved-surface piece inner surface of axial symmetry using existing method

During light Discharge Cleaning, based on " Faraday cup " effect existing for Electric Field Distribution, cause in Glow Discharge Cleaning and coating process

Ion bombardment effects are concentrated mainly on the oral area of the semiclosed curved-surface piece inner surface of axial symmetry, and more remote away from oral area, electric field is weaker, ion

Bombardment effect is poorer, and the problem of cause coating and matrix binding ability weaker, there is provided in a kind of semiclosed curved-surface piece of axial symmetry

Overlay coating uniformly strengthens physical gas-phase deposite method and its application of combination.The present invention changes axle by pictograph impressed current anode

The Electric Field Distribution of symmetrical semiclosed curve surface work pieces inner surface, so as to strengthen the ion bombardment effects during Glow Discharge Cleaning,

Workpiece clean surface before being plated, the combination of the final effectively enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry

Performance.The present invention's is simple to operate, and technique is controllable, favorable repeatability, disclosure satisfy that the need of industrialization large-scale production and application

Will, the strong bonded between the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry and matrix is effectively realized, is significantly carried

It is horizontal to rise equipment manufacturing, there is higher application value and preferable application prospect.

To achieve these goals, the present invention adopts the following technical scheme that:

A kind of method that semiclosed curved-surface piece inner surface coating of axial symmetry uniformly strengthens combination, comprises the following steps:

(1)The opening portion of the semiclosed curve surface work pieces of axial symmetry is set down, and circular flat magnetic controlled sputtering target is arranged at axle

Below symmetrical semiclosed curve surface work pieces, and the semiclosed curve surface work pieces of axial symmetry are mutually overlapping with the axis of circular flat magnetic controlled sputtering target

Close, maintained a certain distance between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target;

(2)One is set to match with the semiclosed curve surface work pieces inner surface of axial symmetry in the opening portion of the semiclosed curve surface work pieces of axial symmetry

The pictograph impressed current anode of conjunction, and the axis of pictograph impressed current anode overlaps with the axis of circular flat magnetic controlled sputtering target;

(3)Pictograph impressed current anode is relatively rotated with the semiclosed curve surface work pieces of axial symmetry, physical vapour deposition (PVD) is carried out, when coating reaches

To after setting value, you can.

In the step 3, carrying out physical vapour deposition (PVD) includes:Glow Discharge Cleaning process, coating process;In glow discharge

In cleaning process, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode ground connection;Work as coating

After reaching setting value, you can.

In the step 3, pictograph impressed current anode is static, and the semiclosed curve surface work pieces of axial symmetry rotate along its axis;

Or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode rotates along its axis;

Or using the axis of the semiclosed curve surface work pieces of axial symmetry as rotary shaft, the semiclosed curve surface work pieces of axial symmetry and pictograph impressed current anode

Relatively rotated along rotary shaft.

In the step 1, gap is formed between the semiclosed curve surface work pieces of axial symmetry and circular flat magnetic controlled sputtering target.

In the step 2, pictograph impressed current anode includes first be engaged with the semiclosed curve surface work pieces opening portion of axial symmetry

Annulus, the arc-shaped connecting rod being engaged with the semiclosed curve surface work pieces inner surface of axial symmetry, anode connecting rod, the arc-shaped connecting rod

Composition anode body is connected as one at least two and arc-shaped connecting rod and the first annulus, the anode body is connected with anode

Bar is connected.

Also include the second annulus, the both ends of the arc-shaped connecting rod are connected as one with the first annulus, the second annulus respectively.

The arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus.

The application of preceding method, using it for the coating of axisymmetric curved surface work piece inner surface band bias uniformly strengthens combination

Physical vapour deposition (PVD).

Use it for magnetron sputtering and prepare the semiclosed curved-surface piece inner surface coating of axial symmetry.

It is poor and uneven in order to solve the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding ability of existing axial symmetry

Technical problem, the present invention, which provides a kind of semiclosed curved-surface piece inner surface coating of axial symmetry, uniformly strengthens the method for combination, specifically

For a kind of Enhancement Method of the semiclosed curve surface work pieces inner surface magnetron sputtering coating binding ability of axial symmetry.This method includes as follows

Step:The semiclosed curve surface work pieces oral area of axial symmetry is placed down, circular flat magnetic controlled sputtering target is disposed below, the two axis

Overlap, target keeps certain distance with the semiclosed curve surface work pieces oral area of axial symmetry;Oral area is put in the semiclosed curve surface work pieces of axial symmetry

A pictograph impressed current anode is put, and its axis overlaps with axis of workpiece;In deposition process, pictograph impressed current anode is static, axial symmetry

Semiclosed curve surface work pieces rotate along axis of workpiece, or the semiclosed curve surface work pieces of axial symmetry are static, pictograph impressed current anode is along axis

Rotate.During Glow Discharge Cleaning, pictograph impressed current anode is connected with power anode.In the present invention, by axial symmetry

Semiclosed curve surface work pieces inner surface setting impressed current anode, to improve the semiclosed curve surface work pieces inner surface electricity of technical process formed symmetrical

The uniformity of bit distribution, acted on so as to strengthen uniform bombardment of the Glow Discharge Cleaning process intermediate ion at each position.I.e. in workpiece

Before plating during Glow Discharge Cleaning, improved by applying positive potential on impressed current anode in the semiclosed curve surface work pieces of axial symmetry

The uniformity of surface potential distribution, so as to improve the uniformity of each position Ions Bombardment, reach the purpose effectively uniformly cleaned, most

The bond strength of the enhancing semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry eventually.

Coating of the present invention with bias suitable for axisymmetric curved surface work piece inner surface technical process uniformly strengthens combination

Physical vapour deposition (PVD), and it is not limited only to magnetron sputtering technique.

Further, the present invention provides a kind of concrete structure of pictograph impressed current anode.The pictograph impressed current anode includes and axle pair

Claim the first annulus that semiclosed curve surface work pieces opening portion is engaged, the arc being engaged with the semiclosed curve surface work pieces inner surface of axial symmetry

Shape connecting rod, the anode connecting rod for being connected with power supply, arc-shaped connecting rod is at least two and arc-shaped connecting rod and the first circle

Ring connects as one composition anode body, and anode body is connected with anode connecting rod.The structure prepare pictograph impressed current anode with

The inner surface of the semiclosed curve surface work pieces of axial symmetry is consistent and simple in construction, and production cost is low, and can effectively solve the present invention's

Technical problem.

Further, the pictograph impressed current anode also includes the second annulus, the both ends of arc-shaped connecting rod respectively with the first annulus,

Two annulus are connected as one.The present invention is cooperated using the first annulus, the second annulus, and it is advantageous to adding for pictograph impressed current anode

Work and manufacture, reduce production cost.

In a specific example, arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus;Will

The semiclosed curve surface work pieces oral area of axial symmetry is placed down, and circular flat magnetic controlled sputtering target is disposed below, and the two axis overlaps, target

Certain distance is kept with axisymmetric curved surface oral area(Target-cardinal distance);Inside axisymmetric curved surface place one with work piece inner surface as

The impressed current anode of shape, its axis overlap with axis of workpiece, and the distance of impressed current anode and work piece inner surface is 3 cm;In glow discharge

In cleaning process, the air pressure of argon working gas is 2.0 Pa, and workpiece bias are -800V, and impressed current anode voltage is+50V, cleaning

Time 30min;In coating process, impressed current anode ground connection;In technical process, workpiece is kept rotating, and pictograph impressed current anode is protected

Hold static.

The present invention changes the Electric Field Distribution of the semiclosed curve surface work pieces inner surface of axial symmetry by pictograph impressed current anode, so as to

Strengthen the ion bombardment effects during Glow Discharge Cleaning, workpiece clean surface before being plated, final effectively enhancing axial symmetry

The binding ability of semiclosed curve surface work pieces inner surface magnetron sputtering coating.After measured, the present invention can be by internal diameter Φ 260mm axle pair

Claim semiclosed curve surface work pieces inner surface magnetron sputtering coating bond strength to greatly improve about 20MPa by minimum about 3MPa, have

Significant technological progress.

In summary, the present invention can effectively overcome the shortcomings of conventional method, the table in the semiclosed curve surface work pieces of axial symmetry

The strong bonded between magnetron sputtering coating and matrix is realized in face, and its method is simple, and technique is controllable, and flow is short, high treating effect.

Practice further demonstrates that the method can significantly improve the combination of the semiclosed curve surface work pieces inner surface magnetron sputtering coating of axial symmetry is strong

Degree, has higher application value.

Brief description of the drawings

Examples of the present invention will be described by way of reference to the accompanying drawings, wherein:

Fig. 1 is the semiclosed curve surface work pieces inner surface magnetron sputtering schematic diagram of conventional method axial symmetry.

Fig. 2 is the semiclosed curve surface work pieces inner surface Glow Discharge Cleaning potential image of conventional method axial symmetry.

Fig. 3 is the semiclosed curve surface work pieces inner surface magnetron sputtering schematic diagram of the formed symmetrical of embodiment 2.

Fig. 4 is the structural representation of pictograph impressed current anode in embodiment 2.

Fig. 5 is the semiclosed curve surface work pieces inner surface Glow Discharge Cleaning potential image of the formed symmetrical of embodiment 2.

Fig. 6 is the semiclosed curve surface work pieces inner surface bond strength measure pull head arrangement schematic diagram of axial symmetry in experimental verification.

Fig. 7 is that embodiment 1 and the bond strength of the semiclosed curve surface work pieces inner surface coating of the gained axial symmetry of embodiment 2 determine

Result figure.

Marked in figure:1st, vacuum chamber, 2, the semiclosed curve surface work pieces of axial symmetry, 3, pictograph impressed current anode, 4, sputtering target, 5,

One annulus, the 6, second annulus, 7, arc-shaped connecting rod, 8, anode connecting rod.

Embodiment

All features disclosed in this specification, or disclosed all methods or during the step of, except mutually exclusive

Feature and/or step beyond, can combine in any way.

Any feature disclosed in this specification, unless specifically stated otherwise, can be equivalent by other or with similar purpose

Alternative features are replaced.I.e., unless specifically stated otherwise, each feature is an example in a series of equivalent or similar characteristics

.

Below by taking the semiclosed curve surface work pieces inner surface magnetron sputtering copper facing of internal diameter Φ 260mm axial symmetry as an example, by right

Effect of the present invention is further described than testing, wherein embodiment 1 is the conventional method without impressed current anode, embodiment 2

To there is the present invention of impressed current anode.

For comparative effectiveness, in addition to the impressed current anode in invention, miscellaneous equipment, frock and technological parameter all same.Tool

Body is as follows:The a diameter of Φ 240mm of plane magnetic controlled sputtering target, target surface apart from axisymmetric curved surface workpiece oral area 100mm, target power output 3kW,

Work Ar Pressure 0.3Pa, is coated with time 1h.In technical process, axial symmetry semiclosed 3 turns/min of curve surface work pieces velocity of rotation is auxiliary

Supporing yang pole remains static.

Wherein, the Potential distribution during the semiclosed curved-surface piece inner surface Glow Discharge Cleaning of axial symmetry is soft using Ansys

Part is calculated, and coat binding strength is measured using POSITEST bond strength testers.

Embodiment 1

Using conventional method, the downward face target surface of the semiclosed curve surface work pieces oral area of axial symmetry is placed, and axis overlaps, such as Fig. 1

It is shown.During Glow Discharge Cleaning, the space potential distribution of near workpieces is as shown in Figure 2.As can be seen that axial symmetry half is sealed

There is the equipotential region of large area in closed surface inside workpiece, in the equipotential region, Ar+ caused by glow discharge can not be added

Fast capacitation, workpiece surface is only flown under initial kinetic energy, collide and send out with other gas atoms in flight course in addition

Raw energy attenuation, the pollutant for causing the ion energy for reaching workpiece surface insufficient and being difficult to adsorb workpiece surface are effectively gone

Remove, such coating atom is difficult to effectively be combined with workpiece substrate, and shows coating and combine deficiency.

Embodiment 2

Using the inventive method, the semiclosed curve surface work pieces oral area face target surface of axial symmetry, and axis overlaps, it is semiclosed in axial symmetry

Impressed current anode is set in curve surface work pieces, and its axis overlaps with axis of workpiece, and impressed current anode is apart from work piece inner surface 3cm, such as Fig. 3 institutes

Show.In order to not influence coating deposition, impressed current anode is four spoke spherical structures(As shown in figure 4, the pictograph impressed current anode include with

The first annulus that the semiclosed curve surface work pieces opening portion of axial symmetry is engaged, it is engaged with the semiclosed curve surface work pieces inner surface of axial symmetry

Arc-shaped connecting rod, the anode connecting rod for being connected with power supply, the second annulus, the both ends of arc-shaped connecting rod respectively with the first circle

Ring, the second annulus are connected as one, and arc-shaped connecting rod is four and is distributed between the first annulus and the second annulus, arc connection

Bar and the first annulus, the second annulus connect as one composition anode body, and anode body is connected with anode connecting rod).In aura

During Discharge Cleaning, pictograph impressed current anode is connected with power anode;In coating process, pictograph impressed current anode ground connection.

During Glow Discharge Cleaning, the space electric field distribution of near workpieces is as shown in Figure 5.As can be seen that after addition impressed current anode, axle

Equipotential region is reduced significantly inside symmetrical semiclosed curve surface work pieces, so as to overcome the deficiency of conventional method.Meanwhile in auxiliary sun

In the presence of the positive potential of pole, the electric-field intensity increase of impressed current anode and the semiclosed curve surface work pieces inner surface of axial symmetry, in the region

In, Ar+ is further accelerated capacitation caused by glow discharge, and the pollution of adsorption is removed so as to effectively bombard workpiece surface

Thing, such coating atom can effectively be combined with workpiece substrate and show the enhancing of coating combination.

Experimental verification

Using above-mentioned glow discharge and technique for preparing coating parameter, embodiment 1, the method for embodiment 2 is respectively adopted in carbon steel, shafts

Symmetrical semiclosed curve surface work pieces inner surface carries out the preparation of copper coating, is then plated using POSITEST bond strength testers

Layer bond strength measure.The pull head for determining bond strength is arranged as shown in fig. 6, being entered between pull head and coating using epoxide-resin glue

Row bonding, and solidify 4h at 100 DEG C.In addition to summit, remaining each latitude arranges 4 measurement points, and measure bond strength is same

The average value of one 4 measured values of latitude, coat binding strength measurement result are as shown in Figure 7.As seen in Figure 7, using biography

System method(Embodiment 1)Resulting coat binding strength with the increase of the semiclosed curve surface work pieces inner surface latitude of axial symmetry and

Reduce, its oral area coat binding strength about 20MPa, and top only has 3MPa or so, this and the electricity during Glow Discharge Cleaning

Bit distribution has direct relation(Because the uniformity of Potential distribution is poor, ion bombardment effects difference during Glow Discharge Cleaning

Significantly, cause much lower compared with the bond strength of oral area at the top of shape face in workpiece);Using the inventive method(Embodiment 2)It is resulting

Coat binding strength uniformity it is good and apparently higher than conventional method, and whole inner surface different parts coat binding strength is basic

Unanimously, about 20MPa, this is due to that the addition of pictograph impressed current anode significantly improves the semiclosed curve surface work pieces inner surface of axial symmetry

Potential distribution uniformity during Glow Discharge Cleaning, each position ion bombardment effects are consistent and cleaning performance is good.

In summary, coat binding strength measurement result shows, the method can significantly improve the semiclosed curved surface work of axial symmetry

The bond strength of part inner surface magnetron sputtering coating.

The invention is not limited in foregoing embodiment.The present invention, which expands to, any in this manual to be disclosed

New feature or any new combination, and disclose any new method or process the step of or any new combination.

图1
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